Decoration and preferential etching of crystal defects in silicon materials: influence of metal decoration on the defect etching process

Abstract

Valentina Croci outlines how the new focus on the user in new technologies and human‐computer interaction is moving towards ‘cognitive engineering’. This puts less emphasis on the actual hardware and more on who uses it and how technology can give new meaning to our daily lives, as well as relevant computer interfaces. Copyright © 2008 John Wiley & Sons, Ltd.

An insight into dislocation density reduction in multicrystalline silicon

“…Etch pits are generally observed using an optical microscope (OM) [41] and sometimes using a scanning electron microscope (SEM) [42]. A software package to quantitatively measure dislocation density, developed at MIT [43], is freely available online at http://pv.mit.edu/dlcounting/.…”