Decoration of alkali halide crystals with In2O3 and SnO2 by a spraying technique

Михайлов, М. Н.; Ratcheva, T.; Nanova, M.

doi:10.1016/0040-6090(87)90440-8

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Cited by 9 publications

(1 citation statement)

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“…A large number of research and development on ceramic coating films has been carried out, for example, for transparent electrode (solar cell) [1], photo-electrochemical film [2], high temperature superconductor [3,4], hybrid film [5], etc. The preparation methods of ceramics thin film are divided into two categories.…”

Section: Introductionmentioning

confidence: 99%

Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

Kohno¹

1992

J Mater Sci

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The titanium nitride coating film was prepared on the Si02 glass substrate by ammonolysis of titanium dioxide coating film formed by sol-gel method. The X-ray diffraction (XRD) pattern indicated that it is cubic titanium nitride with a lattice parameter, a o, of 0.4231 nm. The obtained titanium nitride is non-stoichiometric (TiN x x <_ 1 ) because the value, 0.4231 nm, is smaller than the stoichiometric one (0.4240 nm). The coating film show very high infrared (i.r.) reflectance in the wavelength region of 2-8 lxm.

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Section: Introductionmentioning

confidence: 99%

Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

Kohno¹

1992

J Mater Sci

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Conducting Materials

and¹,

Dahmen²

1996

CVD of Nonmetals

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Growth of In₂O₃ thin films on silicon by the metalorganic chemical vapor deposition method

Kim

Myung

Kim

et al. 2004

Physica Status Solidi (a)

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We have deposited indium oxide (In2O3) films on silicon substrates by the metal organic chemical vapor deposition (MOCVD). We have investigated the effect of substrate temperature on growth and structural properties of films in the range of 200–300 °C. The films had a preferred orientation along [111] direction, with the X‐ray diffraction (XRD) full width at half‐maximum (FWHM) of less than 0.4°.

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Decoration of alkali halide crystals with In2O3 and SnO2 by a spraying technique

Cited by 9 publications

References 4 publications

Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

Conducting Materials

Growth of In₂O₃ thin films on silicon by the metalorganic chemical vapor deposition method

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Decoration of alkali halide crystals with In2O3 and SnO2 by a spraying technique

Cited by 9 publications

References 4 publications

Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

Conducting Materials

Growth of In2O3 thin films on silicon by the metalorganic chemical vapor deposition method

Contact Info

Product

Resources

About

Growth of In₂O₃ thin films on silicon by the metalorganic chemical vapor deposition method