2024
DOI: 10.1109/tase.2023.3323088
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Deep Dynamic Layout Optimization of Photogrammetry Camera Position Based on Digital Twin

Likun Wang,
Zi Wang,
Peter Kendall
et al.

Abstract: The photogrammetry system has been widely used in industrial manufacturing applications, such as high-precision assembly, reverse engineering and additive manufacturing. In order to meet the demand of the product variety and short product lifecycle, the factory facilities including photogrammetry devices, should be relocated in response to rapid change in mechanical structure and hardware integration. Nevertheless, the camera position of the photogrammetry system is difficult to select to guarantee an optimal … Show more

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