2022 6th IEEE Electron Devices Technology &Amp; Manufacturing Conference (EDTM) 2022
DOI: 10.1109/edtm53872.2022.9798172
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Deep Learning Approach to Estimating Work Function Fluctuation of Gate-All-Around Silicon Nanosheet MOSFETs with A Ferroelectric HZO Layer

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Cited by 3 publications
(2 citation statements)
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“…Akbar et al used ML methods to assist device simulation of work function fluctuations for 3D multi-channel gates around silicon nanosheet MOSFETs [14]. DL algorithms are also used to evaluate the work function fluctuations of GAAFETs [15,16].…”
Section: Introductionmentioning
confidence: 99%
“…Akbar et al used ML methods to assist device simulation of work function fluctuations for 3D multi-channel gates around silicon nanosheet MOSFETs [14]. DL algorithms are also used to evaluate the work function fluctuations of GAAFETs [15,16].…”
Section: Introductionmentioning
confidence: 99%
“…Computational studies, such as the Fourier-Bessel model [16], machine learning (ML) methodologies [17], and deep learning (DL) [18] approaches are much needed in the WKF-induced device variability. Due to their reliability and scalability while upholding the same efficiency, ML/DL approaches are playing crucial roles in applied science and technology, such as image classification [19], computer vision [20], machine translation [21], human-computer interaction [22], natural language processing [23], and many more.…”
Section: Introductionmentioning
confidence: 99%