Deep Reactive Ion Etching of Z-Cut Alpha Quartz for MEMS Resonant Devices Fabrication

Li, Bo; Li, Cun; Zhao, Yue; Zhang, Quanwei

doi:10.3390/mi11080724

Cited by 15 publications

(7 citation statements)

References 45 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Modification of a surface layer of alpha quartz (α-quartz) at irradiation with particles (ions, neutrons, electrons) was a subject of multiple studies in the second half of the last century due to rapid development of microelectronics [1,2], and this science and technology direction is in demand now [3], particularly due to development of electromechanical microsensor devices [4], applied under radiation conditions [5]. This study is related to a change of mechanical destruction mechanism under field impact load of α-quartz, preliminary implanted with ions of Ar + .…”

Section: Introductionmentioning

confidence: 99%

Correlated accumulation of microcracks in impact damaged surface of α-quartz amorphized by Ar-=SUP=-+-=/SUP=- ions implantation

I.P.

A.E.

2022

Physics of the Solid State

View full text Add to dashboard Cite

The microcrack accumulation in impact damaged α-quartz plates prior to and after the Ar+-ion implantation was studied with the acoustical emission (AE) method. The 40 keV implantation doses of 1014 and 1016 ion/cm2 were applied. The statistical analysis of the energy distribution in impact-induced AE time series detected in unirradiated samples showed a random (poissonian type) accumulation of defects which is specific for mechanical destruction of homogeneous brittle materials. The energy distribution in the AE time series excited when damaging the preliminary implanted samples followed a power law typical for the fracture of heterogeneous solids such as rocks, ceramics, etc. The optical photography evidenced a transition from brittle (prior to implantation) to ductile damage formation caused by the disturbed interconnectivity of the crystalline structure in irradiated specimens. Keywords: ion implantation, alpha quartz, impact damaging, acoustical emission.

show abstract

Section: Introductionmentioning

confidence: 99%

Correlated accumulation of microcracks in impact damaged surface of α-quartz amorphized by Ar-=SUP=-+-=/SUP=- ions implantation

I.P.

A.E.

2022

Physics of the Solid State

View full text Add to dashboard Cite

show abstract

“…In order to trim the frequency-increasing of QCRs, ion beam etching, laser etching and chemical corrosion are used to reduce the mass of the electrode or wafer. Ion beam etching, which became popular in 1999, is an effective method to trim the frequency of quartz [ 6 , 7 , 8 ]. Ion beam etching generally does not damage the electrodes; is less affected by the mask; and has high frequency modulation accuracy, which can improve the resonator yield.…”

Section: Introductionmentioning

confidence: 99%

Research on Trimming Frequency-Increasing Technology for Quartz Crystal Resonator Using Laser Etching

et al. 2021

View full text Add to dashboard Cite

A quartz crystal resonator (QCR) is an indispensable electronic component in the field of the modern electronics industry. By designing and depositing electrodes of different shapes and thicknesses on a quartz wafer with a certain fundamental frequency, the desired target frequency can be obtained. Affected by factors such as the deposition equipment, mask, wafer size and placement position, it is difficult to accurately obtain the target frequency at a given time, especially for mass-produced QCRs. In this work, a laser with a wavelength of 532 nm was used to thin the electrodes of a QCR with a fundamental frequency of 10 MHz. The electrode surface was etched through a preset processing pattern to form a processing method of local thinning of the electrode surface. At the same time, the effect of laser etching on silicon dioxide and resonator performance was analyzed. Satisfactory trimming frequency-increasing results were achieved, such as a frequency modulation accuracy of 1 ppm, frequency distribution with good consistency and equivalent parameters with small changes, by the laser partial etching of the resonator electrode. However, when the surface electrode was etched into using through-holes, the attenuation amplitude of the equivalent parameter became larger, especially in terms of the quality factor (Q), which decreased from 63 K to 1 K, and some resonators which had a serious frequency drift of >40%. In this case, a certain number of QCRs were no longer excited to vibrate, which was due to the disappearance of the piezoelectric effect caused by the local thermal phase change in the quartz wafer.

show abstract

“…Currently many different methods for the microsensors manufacturing have been developed. The well-known technique is machining by deep reactive-ion etching process [14][15][16]. This is an etch process with high anisotropy used to create deep holes and vertical walls in wafers with high aspect ratios.…”

Section: Introductionmentioning

confidence: 99%

Wideband MOEMS for the Calibration of Optical Readout Systems

Volkov

Luk’yanov

Goryunov

et al. 2021

Sensors

View full text Add to dashboard Cite

The paper proposes a technology based on UV-LIGA process for microoptoelectromechanical systems (MOEMS) manufacturing. We used the original combination of materials and technological steps, in which any of the materials does not enter chemical reactions with each other, while all of them are weakly sensitive to the effects of oxygen plasma. This made it suitable for long-term etching in the oxygen plasma at low discharge power with the complete preservation of the original geometry, including small parts. The micromembranes were formed by thermal evaporation of Al. This simplified the technique compared to the classic UV-LIGA and guaranteed high quality and uniformity of the resulting structure. To demonstrate the complete process, a test MOEMS with electrostatic control was manufactured. On one chip, a set of micromembranes was created with different stiffness from 10 nm/V to 100 nm/V and various working ranges from 100 to 300 nm. All membranes have a flat frequency response without resonant peaks in the frequency range 0–200 kHz. The proposed technology potentially enables the manufacture of wide low-height membranes of complex geometry to create microoptic fiber sensors.

show abstract

Deep Reactive Ion Etching of Z-Cut Alpha Quartz for MEMS Resonant Devices Fabrication

Cited by 15 publications

References 45 publications

Correlated accumulation of microcracks in impact damaged surface of α-quartz amorphized by Ar-=SUP=-+-=/SUP=- ions implantation

Correlated accumulation of microcracks in impact damaged surface of α-quartz amorphized by Ar-=SUP=-+-=/SUP=- ions implantation

Research on Trimming Frequency-Increasing Technology for Quartz Crystal Resonator Using Laser Etching

Wideband MOEMS for the Calibration of Optical Readout Systems

Contact Info

Product

Resources

About