Deep UV photolithographic systems and processes

Abstract

Deep UV[200 to 300 nanometers (nm)] photolithography has received much recent attention because it promises higher resolution than conventional exposure technology. Except for the change in wavelength from the 400 nm region, the exposure technology would remain virtually unchanged. We will discuss resist materials and processes explored in the last few years for optimization of deep UV lithography. Particular emphasis is placed upon the chemistry of resist design, multilevel processing schemes, and new sources for deep UV exposure.

Direct deep UV lithography to micropattern PMMA for stem cell culture

“…A Nikon Eclipse Ti–S inverted microscope was used to perform fluorescent imaging. Images were analyzed using either Nikon NIS Elements software or FIJI [ 4 ]. To increase the signal visibility, the Look-up tables were modified during post-processing where required.…”

“…Deep UltraViolet (DUV) lithography is a photolithography technique that employs wavelengths below 280 nm [ 4 ]. DUV lithography can be easily scalable, relatively inexpensive and does not necessarily involve large equipment [ 5 ].…”

Polystyrene Pocket Lithography: Sculpting Plastic with Light

“…First, we propose a new direct lithography method in PS using specialized irradiation equipment and photomasks but already not being dependent on temperature‐ and humidity‐controlled and ultraviolet (UV)‐filtered (yellow‐light) cleanroom laboratories. The selective photodegradation of PS uses deep UV (DUV), which comprises wavelengths below 280 nm (with 193–254 nm frequently used for DUV lithography [ 13,14 ] ). Unlike commercial photosensitive resists commonly used in lithography, the use of PS, as described in this study, requires no preprocessing and has a long shelf life.…”

Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

“…Photopolymers play an important role in current technologies and enable the processing of a wide variety of novel materials 1. However, few of the photopolymers investigated to date exhibit photoinduced conversion to monomers under mild conditions 2–8. Poly(olefin sulfone)s possess sulfonyl groups (SO 2 ) in the main chain and are easily synthesized by radical polymerization of olefin monomers in liquefied sulfur dioxide 9.…”