In this study, we propose a straightforward method for x determination in sub-stoichiometric nickel oxide (Ni1-xO) films prepared by ultrasonic spray pyrolysis on Fluor-Tin Oxide (FTO) substrates by varying the post-deposition thermal treatment. The Ni 3+ concentration, the flat band potential (Φfb) and the open circuit potential (Voc) were determined by electrochemical impedance analysis in aqueous media and correlated to the transmission of as-deposited Ni1-xO films. An X-Ray photoelectron spectroscopy study was also performed to quantify the amount of Ni 3+ in the films and compare it with the one determined by electrochemical analysis. The electrochromic behavior of the Ni1-xO films in non-aqueous electrolyte was investigated as well. With increasing Ni 3+ concentration the films became more brownish and more conductive, both Voc and Φfb values increased. Calibration curves of transmission at 550 nm or open circuit potential vs. carrier concentration were plotted and allowed the prediction of x in an unknown Ni1-xO sample. The Ni1-xO films characterized by the highest Ni 3+ concentration have a darker colored state but lower transmission modulation, due to their reduced specific surface and increased crystallinity.