2021
DOI: 10.1016/j.jeurceramsoc.2021.03.031
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Defect engineering of ZnO: Review on oxygen and zinc vacancies

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Cited by 166 publications
(81 citation statements)
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“…When the Ar plasma treatment was performed, the sheet resistance of the AZO thin film significantly decreased to approximately 2.45 kΩ sq −1 . In general, the generation of defects such as oxygen vacancies (for n-type) or metal vacancies (for p-type) in the oxide thin film generated free electrons or holes, which increased the conductivity of the oxide thin film [41][42][43]. Here, the decrease in the sheet resistance during the Ar plasma treatment may be due to the increase in simultaneous structural defects of the AZO thin film.…”
Section: Resultsmentioning
confidence: 99%
“…When the Ar plasma treatment was performed, the sheet resistance of the AZO thin film significantly decreased to approximately 2.45 kΩ sq −1 . In general, the generation of defects such as oxygen vacancies (for n-type) or metal vacancies (for p-type) in the oxide thin film generated free electrons or holes, which increased the conductivity of the oxide thin film [41][42][43]. Here, the decrease in the sheet resistance during the Ar plasma treatment may be due to the increase in simultaneous structural defects of the AZO thin film.…”
Section: Resultsmentioning
confidence: 99%
“…However, photoelectric sensors based on ZnO still face some pressing problems, such as the high resistivity of ZnO, which leads to a low photocurrent and poor detection performance of the photoelectric sensor [ 98 ]. Moreover, the question of how to break through the limitation that the band gap of ZnO just corresponds to the ultraviolet band, which is a tough problem, needs to be solved.…”
Section: Research Progress Of Zno Nanosensormentioning
confidence: 99%
“…There exist three basic consensuses for the roles played by V O in material behaviors. First, V O , possessing abundant localized electrons, generally acts as an electron donor 59 , 60 , 62 , 65 67 , 69 , 70 and manipulates the carrier density (bulk resistance) of semiconductor materials, 59 , 60 , 62 especially for n-type metal oxides. As interfacial defects, the electron-rich nature of oxygen vacancies will facilitate the adsorption of O 2 molecules and increase the content of chemisorbed oxygen species.…”
Section: Introductionmentioning
confidence: 99%