2012
DOI: 10.1016/j.actamat.2012.07.046
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Defect microstructure in heavy-ion-bombarded (0 0 0 1) ZnO

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Cited by 19 publications
(24 citation statements)
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“…The IP depth location depends on the ion mass, implanted ion fluence, and treatment conditions . Typically, it is located below 25 nm from the surface . As the depth resolution of our RBS/c measurements is about 10 nm, the IP, located in the region of energy 1300–1320 keV, cannot be separated from the surface peak, which can be found in the region 1320–1340 keV.…”
Section: Resultsmentioning
confidence: 91%
“…The IP depth location depends on the ion mass, implanted ion fluence, and treatment conditions . Typically, it is located below 25 nm from the surface . As the depth resolution of our RBS/c measurements is about 10 nm, the IP, located in the region of energy 1300–1320 keV, cannot be separated from the surface peak, which can be found in the region 1320–1340 keV.…”
Section: Resultsmentioning
confidence: 91%
“…As a result, radiation generated defects are mobile at RT and high-dose irradiation with heavy ions does not render ZnO amorphous at RT. Ion-beam-produced disorder has been intensively investigated in ZnO [2][3][4][5][6][7][8][9][10][11][12]. For a wide range of irradiation conditions, the level of stable post-implantation disorder in the ZnO crystal bulk depends linearly on the concentration of ballistically generated lattice displacements [4][5][6].…”
Section: Dynamic Annealing In Znomentioning
confidence: 99%
“…In particular, an anomalous intermediate defect peak (IP) has been observed in depth profiles of Rev. 1.2 lattice disorder in (0001) ZnO irradiated with heavy or cluster ions and measured by high-resolution Rutherford backscattering and channeling (RBS/C) [4,6,[11][12][13].…”
Section: Dynamic Annealing In Znomentioning
confidence: 99%
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