2003
DOI: 10.1063/1.1593817
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Defect reduction in (112̄0) a-plane gallium nitride via lateral epitaxial overgrowth by hydride vapor-phase epitaxy

Abstract: This letter reports on the reduction in extended-defect densities in a-plane (112̄0) GaN films achieved via lateral epitaxial overgrowth (LEO) by hydride vapor phase-epitaxy. A variety of dielectric mask patterns was used to produce 8–125-μm-thick, fully coalesced nonpolar GaN films. The nanometer-scale pit densities in the overgrown regions were less than 3×106 cm−2 compared to ∼1010 cm−2 in the direct-growth a-plane GaN. Cathodoluminescence revealed a fourfold increase in luminous intensity in the overgrown … Show more

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Cited by 186 publications
(145 citation statements)
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“…To improve the efficiency of GaN-based devices, various strategies are employed with the aim to reduce the high dislocation densities inherent to the heteroepitaxial growth of GaN and avoiding polarization fields which are detrimental to optical devices [2,3]. However, these growth strategies often result in the formation of stacking faults: Especially the growth of non-and semi-polar GaN layers [4][5][6][7][8] as well as epitaxial-lateral overgrowth [9][10][11][12][13][14] or the coalescence overgrowth of nanowires [15][16][17][18] are associated with the formation of basal-plane stacking faults independent of which growth technique is used. As a consequence, the emission characteristics and transport properties of the layers are changed [11,19].…”
Section: Introductionmentioning
confidence: 99%
“…To improve the efficiency of GaN-based devices, various strategies are employed with the aim to reduce the high dislocation densities inherent to the heteroepitaxial growth of GaN and avoiding polarization fields which are detrimental to optical devices [2,3]. However, these growth strategies often result in the formation of stacking faults: Especially the growth of non-and semi-polar GaN layers [4][5][6][7][8] as well as epitaxial-lateral overgrowth [9][10][11][12][13][14] or the coalescence overgrowth of nanowires [15][16][17][18] are associated with the formation of basal-plane stacking faults independent of which growth technique is used. As a consequence, the emission characteristics and transport properties of the layers are changed [11,19].…”
Section: Introductionmentioning
confidence: 99%
“…Professor Nakamura and his colleagues at the University of California, Santa Barbara (UCSB) made a significant contribution to the research on nonpolar/semipolar crystal growth and devices under the Exploratory Research for Advanced Technology (ERATO) program sponsored by the Japan Science and Technology Agency (JST). (10) The lowdefect growth of a-plane, (11) m-plane, (12) and semipolar-plane (13) GaN was achieved through epitaxial lateral overgrowth, and an a-plane LED was demonstrated in 2005, (14) as shown in Fig. 2.…”
Section: Challenges Toward Realizing Innovative Devices Using Gan Submentioning
confidence: 99%
“…Therefore, the reduction of TD density is essential to improve the performance of a-plane light-emitting devices. Lateral epitaxial overgrowth (LEO) techniques were widely employed in the past to reduce defect density in nonpolar GaN [12]. In our previous work, we performed the LEO on a series of nanorod templates with varied etching depth to realize the defect-reduction and quality improvement in the subsequently grown a-plane GaN layer [13].…”
Section: Introductionmentioning
confidence: 99%