1997
DOI: 10.1116/1.589578
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Degradation measurements using fully processed test transistors in high density plasma reactors for failure analysis

Abstract: Articles you may be interested inMechanism and lifetime prediction method for hot-carrier-induced degradation in lateral diffused metal-oxidesemiconductor transistors Appl. Phys. Lett. 92, 243501 (2008); 10.1063/1.2947588Dependence of the performance and reliability of n-metal-oxide-silicon field effect transistors on interlayer dielectric processing Nanopotentiometry: Local potential measurements in complementary metal-oxide-semiconductor transistors using atomic force microscopy High temperature performance … Show more

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“…As a result, the gate capacitance can be affected and a permanent electrical field can be induced, respectively. Therefore, parameters which respond sensitive to gate oxide degradation have to measure [8].…”
Section: Resultsmentioning
confidence: 99%
“…As a result, the gate capacitance can be affected and a permanent electrical field can be induced, respectively. Therefore, parameters which respond sensitive to gate oxide degradation have to measure [8].…”
Section: Resultsmentioning
confidence: 99%