Degradation mechanism of laser-induced damage of porous ZrO2/SiO2 high reflective films in vacuum

Optically transparent Zr–Si-B-N films on quartz plates were manufactured by direct current magnetron sputtering of multiphase ZrB2-50%ZrSi2 ceramic cathode. Structural investigations have been carried out using X-ray diffraction analysis, scanning electron microscopy, and glow-discharge optical-emission spectroscopy. The dependences of optical properties including transmittance, reflectivity, and refractive index, vs. wavelength were determined by spectrophotometry. Films exhibited amorphous structure, average mechanical properties (hardness of 11 GPa, elastic modulus of 135 GPa, elastic recovery of 53%) and demonstrated transmittance up to 90 % and reflectivity ∼15%.

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Degradation mechanism of laser-induced damage of porous ZrO2/SiO2 high reflective films in vacuum

Cited by 3 publications

References 18 publications

Material removal characteristics of TC4 alloy by continuous wave irradiation at low pressure

Material removal characteristics of TC4 alloy by continuous wave irradiation at low pressure

Different material modifications in laser-induced damage of optical films in air and vacuum environments

Optical characteristics of NUV-VIS-NIR transparent Zr-Si-B-N hard films for protection of optical and laser devices

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