2009
DOI: 10.1143/jjap.48.076003
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Degradation Mechanism of Secondary Electron Emission in Plasma-Exposed MgO Films

Abstract: Degradation mechanism of secondary electron emission (SEE) properties in plasma-exposed MgO films was studied using three types of plasma ion; He þ , Ne þ , and Ar þ . As the mass of impinging ions increased from He þ to Ar þ , the SEE coefficient () of MgO decreased from 0.0227 to 0.0175. Synchrotron radiation photoemission spectroscopy revealed that the Mg-to-O ratio significantly decreased from 1.00 to 0.79 in He plasma, to 0.73 in Ne plasma, and to 0.66 in Ar plasma. This was due to the preferential sputte… Show more

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Cited by 6 publications
(4 citation statements)
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“…For instance, when the deposition of atoms occurs at temperatures well above the Mg melting point (923 K), Mg vacancies can be stabilized in an excess of oxygen atmosphere (0.33 mbar). On the contrary, if the substrate temperature is held below 700 K, a pressure of about 5×10 −4 mbar is required to optimize the film quality, while the replacement of oxygen with heavier Ar + plasma ion, which increases the growth rate, significantly altered the Mg-to-O ratio [12,13]. This allows for a control on the final number of cation vacancies in films [8].…”
Section: Resultsmentioning
confidence: 99%
“…For instance, when the deposition of atoms occurs at temperatures well above the Mg melting point (923 K), Mg vacancies can be stabilized in an excess of oxygen atmosphere (0.33 mbar). On the contrary, if the substrate temperature is held below 700 K, a pressure of about 5×10 −4 mbar is required to optimize the film quality, while the replacement of oxygen with heavier Ar + plasma ion, which increases the growth rate, significantly altered the Mg-to-O ratio [12,13]. This allows for a control on the final number of cation vacancies in films [8].…”
Section: Resultsmentioning
confidence: 99%
“…Such a vacancy concentration ϳ10 21 / cm 3 , although high, is not unusual in MgO. 24,41 For the sake of comparison, in virgin MgO crystals the concentration of V-type centers is typically ϳ10 18 / cm 3 . 42 It should be mentioned that in our case the deposition of atoms proceeded at temperatures well above the Mg melting point ͑ϳ923 K͒.…”
Section: A Structural Characterizationmentioning
confidence: 99%
“…Measurement of secondary electron emission (SEE) coefficient (γ) was done using a breakdown voltage (V B ) measurement system from Paschen relation. 20,21 ' EXPERIMENTAL SECTION An n +2 -type (100) silicon substrate doped with arsenic (resistivity < 0.004 Ω 3 cm) was used as a starting substrate.…”
Section: ' Introductionmentioning
confidence: 99%
“…Moreover, the MgO films with high concentration of oxygen vacancies were examined for application to secondary electron emitter. Measurement of secondary electron emission (SEE) coefficient (γ) was done using a breakdown voltage ( V B ) measurement system from Paschen relation. , …”
Section: Introductionmentioning
confidence: 99%