1991
DOI: 10.1016/0022-0248(91)90978-e
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Delta-doping of GaAs and Al0.33Ga0.67As with Sn, Si and Be: a comparative study

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Cited by 80 publications
(15 citation statements)
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“…The behaviour of Mn during the growth of GaMnAs is similar to many other dopants e.g. Sn-doped GaAs [10], where the solubility limit increases with decreasing temperature [8]. In such cases, incorporation into the growing film is from an enhanced surface concentration.…”
Section: Mn Incorporation In Gamnasmentioning
confidence: 99%
“…The behaviour of Mn during the growth of GaMnAs is similar to many other dopants e.g. Sn-doped GaAs [10], where the solubility limit increases with decreasing temperature [8]. In such cases, incorporation into the growing film is from an enhanced surface concentration.…”
Section: Mn Incorporation In Gamnasmentioning
confidence: 99%
“…Considerable progress has been made recently in improving the properties of 2DEGs and 2DHGs formed at the inverted interface by reducing the tendency of dopants to diffuse and segregate [11], using low temperature growth techniques [12]. It is now possible to grow a variety of coupled electron-electron and electron-hole gas stuctures using similar methods.…”
Section: Inverted Structures and Quantum Wellsmentioning
confidence: 99%
“…A likely mechanism for these unintentionally placed impurities is Si segregation on the growing front. On the basis of the data presented by Harris et al (1991) we would expect Si segregation to give rise to -1-2 donors in the quantum well of a device with area 0.1Ijm 2 .…”
Section: Ft=35 K Fmentioning
confidence: 99%