Fluorinated photodefinable polymers are widely employed
as re-distribution
layers in wafer-level packaging to produce microelectronic devices
because of their suitable low dielectric constant and moisture absorption,
high mechanical toughness, thermal conductivity and stability, and
chemical inertness. Typically, fluorinated photodefinable polybenzoxazoles
(F-PBOs) are the most used in this field. In the present work, we
investigated by atomic force microscopy, X-ray photoelectron spectroscopy,
and Fourier transform infrared spectroscopy the morphological and
chemical modifications induced by Ar plasma treatments on F-PBO films.
This process, used to remove surface contaminant species, as well
as increase the polymeric surface roughness, to improve the adhesion
to the other components during electronic packaging, is a crucial
step during the manufacturing of some microelectronic devices. We
found that argon plasma treatments determine the wanted drastic increase
of the polymer surface roughness but, in the presence of a patterned
silver layer on F-PBO, needed for the fabrication of electric contacts
in microelectronic devices, also induce some unwanted formation of
silver fluoride species.