2015
DOI: 10.1116/1.4929509
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Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Abstract: The Semiconductor High-Numerical-aperture (NA) Actinic Reticle Review Project (SHARP) is an extreme ultraviolet (EUV)-wavelength, synchrotron-based microscope dedicated to advanced EUV photomask research. The instrument is designed to emulate current and future generations of EUV lithography (EUVL). The performance of the SHARP microscope has been well characterized for its low-NA lenses, emulating imaging in 0.25 and 0.33 NA lithography scanners. Evaluating the resolution of its higher-NA lenses, intended to … Show more

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Cited by 18 publications
(11 citation statements)
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“…The resolution is comparable to the latest high-end Zone-plate based X-ray microscopes operated at large scale facilities [1] which are e.g. employed for mask and chip inspection [3]. Our work demonstrates that a similar resolution is now available with a table-top setup.…”
supporting
confidence: 61%
See 1 more Smart Citation
“…The resolution is comparable to the latest high-end Zone-plate based X-ray microscopes operated at large scale facilities [1] which are e.g. employed for mask and chip inspection [3]. Our work demonstrates that a similar resolution is now available with a table-top setup.…”
supporting
confidence: 61%
“…Since no optics is needed between the sample and the detector, it is scalable to smallest resolutions provided that a high photon flux short wavelength light source with good coherence is used for illumination. Despite huge technological efforts, the resolution of conventional X-ray microscopes is still limited to 12 nm to 20 nm [1][2][3] by the fabrication precision of the employed zone plates. In contrast, coherent diffractive imaging and related techniques demonstrated 7 nm [4] and 5 nm resolution [5] already which can be improved with the availability of a better source.…”
mentioning
confidence: 99%
“…A resolution of 22 nm half pitch (hp) on the mask side, corresponding to 5.5 nm hp on the wafer side in a 4x lithography system, has been demonstrated for the 0.625 4x NA lens. 15 To emulate the source angular spectrum of the scanner, SHARP has a fully programmable Fourier synthesis illuminator. 16 SHARP's flexible design allows it to respond to new developments in EUVL and to emulate arbitrary technologies under consideration.…”
Section: Introductionmentioning
confidence: 99%
“…Because the achievable resolution scales with the wavelength, light sources in the XUV and X-ray spectral range are necessary for the highest resolution. Unfortunately, in conventional X-ray microscopes, the resolution is not limited by the wavelength of the source alone but rather by the quality of optics used for focusing and/or image formation 3 5 . To overcome limitations imposed by X-ray optics, the intensity distribution of the light scattered from the sample can directly be measured on a pixelated detector and the missing phase information can be retrieved by using phase retrieval algorithms 6 .…”
Section: Introductionmentioning
confidence: 99%