Demonstration of a New Technique for the Transfer Printing of Graphene on Photonic Devices

Shiramin, Leili Abdollahi; Bazin, Alexander; Verstuyft, Steven; Lycke, Sylvia; Vandenabeele, Peter; Roelkens, Günther; Thourhout, Dries Van

doi:10.1364/cleo_si.2017.sw4k.6

Cited by 3 publications

(3 citation statements)

References 8 publications

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“…Printing structures of such reduced dimensions poses new challenges that are less significant for III-V lasers or PDs [42] discussed in previous sections. Still, the developed printing process remains largely inspired by these more rigid devices, while it also relates to previous efforts for printing confined material structures such as graphene films [43]. Some adaptations were required to manage the internal stresses in the coupon.…”

Section: Towards Heterogeneously Integrated Single-photon Sourcesmentioning

confidence: 99%

Micro-Transfer Printing for Heterogeneous Si Photonic Integrated Circuits

Roelkens

Zhang

Bogaert

et al. 2023

IEEE J. Select. Topics Quantum Electron.

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Silicon photonics (SiPh) is a disruptive technology in the field of integrated photonics and has experienced rapid development over the past two decades. Various high-performance Si and Ge/Si-based components have been developed on this platform that allow for complex photonic integrated circuits (PICs) with small footprint. These PICs have found use in a wide range of applications. Nevertheless, some non-native functions are still desired, despite the versatility of Si, to improve the overall performance of Si PICs and at the same time cut the cost of the eventual Si photonic system-on-chip. Heterogeneous integration is verified as an effective solution to address this issue, e.g. through die-wafer-bonding and flip-chip. In this paper, we discuss another technology, micro-transfer printing, for the integration of nonnative material films/opto-electronic components on SiPh-based platforms. This technology allows for efficient use of non-native materials and enables the (co-)integration of a wide range of materials/devices on wafer scale in a massively parallel way. In this paper we review some of the recent developments in the integration of non-native optical functions on Si photonic platforms using micro-transfer printing.

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Section: Towards Heterogeneously Integrated Single-photon Sourcesmentioning

confidence: 99%

Micro-Transfer Printing for Heterogeneous Si Photonic Integrated Circuits

Roelkens

Zhang

Bogaert

et al. 2023

IEEE J. Select. Topics Quantum Electron.

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“…After fabrication of the SOI-PhC nano-cavity, graphene is transfer printed on top using the process described in [15] and [16]. We first fabricate micron-size patterns of graphene on a source substrate using photolithography and an oxygen plasma process.…”

Section: Design and Fabricationmentioning

confidence: 99%

“…Subsequently, the protective resist is removed with acetone. More detail about the graphene transfer process can be found in [15] and [16]. The next step is to fabricate the palladium contact pads on the graphene layer, 1 μm away from the cavity edges.…”

Section: Design and Fabricationmentioning

confidence: 99%

High Extinction Ratio Hybrid Graphene-Silicon Photonic Crystal Switch

Shiramin

Wang

Snyder

et al. 2018

IEEE Photon. Technol. Lett.

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In this letter, we demonstrate a compact optical switch realized by integrating a graphene layer with a silicon photonic crystal cavity fabricated using deep UV immersion lithography and a novel transfer printing approach. A 17-dB extinction ratio and 0.75-nm shift in the cavity resonance are measured for a swing voltage of only 1.2 V. The graphene layer is limited to 1 × 5 µm in size. The experimental results are linked to a theoretical model and used to predict possible improvements to the design.

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Narrowband silicon waveguide Bragg reflector achieved by highly ordered graphene oxide gratings

et al. 2017

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Graphene oxide (GO) ultrathin film can be wafer-scale deposited by spin coating, can be patterned by laser interference lithography and oxygen plasma etching, can be thinned atomically (0.26 nm/min) and oxidized by ozone treatment, and is a relatively transparent and low-refractive-index material compared to pristine graphene. All those unique properties prompt us to realize a low-loss (∼5 dB/cm), high-extinction-ratio (19 dB), and narrowband (0.425 nm) GO/silicon hybrid waveguide Bragg reflector by transferring 7-nm-thick GO gratings (n=1.58) atop a silicon strip waveguide. Unlike a sidewall-corrugated strip waveguide Bragg reflector that generally exhibits distorted corrugation profiles and is sensitive to fabrication errors, the as-realized GO-grating-covered strip waveguide Bragg reflector exhibits a stable reflecting wavelength and controllable reflection bandwidth that can be well predicted by numerical simulations.

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Demonstration of a New Technique for the Transfer Printing of Graphene on Photonic Devices

Abstract: Abstract:We demonstrate an automated method for transfer printing of micron sized graphene patterns on predefined sites on a photonic chip. Silicon nitride waveguides with graphene transferred on top exhibit an absorption loss of 0.054dB/µm, in line with simulation results.

Cited by 3 publications

References 8 publications

Micro-Transfer Printing for Heterogeneous Si Photonic Integrated Circuits

Micro-Transfer Printing for Heterogeneous Si Photonic Integrated Circuits

High Extinction Ratio Hybrid Graphene-Silicon Photonic Crystal Switch

Narrowband silicon waveguide Bragg reflector achieved by highly ordered graphene oxide gratings

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