2021
DOI: 10.1016/j.surfin.2021.101582
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Dependence of magnetic domain patterns on plasma-induced differential oxidation of CoPd thin films

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Cited by 2 publications
(2 citation statements)
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“…(The measurement of a minor hysteresis loop at the first step exhibits no exchange bias (see the Supporting Information), indicating that there is no observable coupling between the two FM sources. , ) This two-step reversal is absent from loop C, which implies modification of the film properties induced by plasma pretreatment on area A. It is known from our previous studies that plasma pretreatment triggers faster surface oxidation of the CoPd film, and oxidation leads to a reduction in the coercive field H c . Therefore, the first and second steps of the reversal in area A are attributed to the top partially oxidized layer and the bottom CoPd layer, respectively, as illustrated in Figure b.…”
Section: Experimental Results and Discussionmentioning
confidence: 88%
See 1 more Smart Citation
“…(The measurement of a minor hysteresis loop at the first step exhibits no exchange bias (see the Supporting Information), indicating that there is no observable coupling between the two FM sources. , ) This two-step reversal is absent from loop C, which implies modification of the film properties induced by plasma pretreatment on area A. It is known from our previous studies that plasma pretreatment triggers faster surface oxidation of the CoPd film, and oxidation leads to a reduction in the coercive field H c . Therefore, the first and second steps of the reversal in area A are attributed to the top partially oxidized layer and the bottom CoPd layer, respectively, as illustrated in Figure b.…”
Section: Experimental Results and Discussionmentioning
confidence: 88%
“…It is known from our previous studies that plasma pretreatment triggers faster surface oxidation of the CoPd film, and oxidation leads to a reduction in the coercive field H c . 43 Therefore, the first and second steps of the reversal in area A are attributed to the top partially oxidized layer and the bottom CoPd layer, respectively, as illustrated in Figure 2b. As plasma treatment and the follow-up oxidation can induce segregation and migration of some Co atoms in the film to form Co oxides on the surface, a thin layer of Pd-rich phase is established above the bottom CoPd layer underneath the oxides.…”
Section: Resultsmentioning
confidence: 94%