Dependence of O2 and Ar2 flow rates on the physical properties of ATO thin films deposited by atmospheric pressure chemical vapor deposition (APCVD)

Fadavieslam, M. R.; Sadra, S.

doi:10.1007/s00339-017-1229-2

Appl. Phys. A

2017

DOI: 10.1007/s00339-017-1229-2

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Dependence of O2 and Ar2 flow rates on the physical properties of ATO thin films deposited by atmospheric pressure chemical vapor deposition (APCVD)

M. R. Fadavieslam

S. Sadra

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Dependence of O2 and Ar2 flow rates on the physical properties of ATO thin films deposited by atmospheric pressure chemical vapor deposition (APCVD)

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References 22 publications

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