Deposition and characterization of Ti–Cx–Ny nanocomposite films by pulsed bias arc ion plating

TiCrN coatings were deposited onto high-speed steel substrates by arc ion plating. The crystalline structure of the coatings was analysed by X-ray diffraction. Influence of both negative bias applied to the substrates and nitrogen flowrate on the crystalline structure was investigated. Scanning electron microscopy was employed to observe the surface quality of the coatings. Hardness of the coatings was measured by the XP nanoindenter. It is indicated that both size and quantity of the macroparticles decrease with increasing negative bias. TiCrN coatings with enhanced hardness can be obtained when a larger negative bias is applied. Increasing nitrogen flowrate benefits hardness of the coatings as well. Compared with the TiN thin film, the TiCrN coatings exhibit better mechanical behaviour due to the solid solution strengthening effects caused by the doped Cr atoms. Influence of deposition parameters on the structure and mechanical properties has been discussed.

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“…They are formed when the macroparticles that are not tightly adhesive to the surface are detached by ion bombardment. 15–16…”

Section: Resultsmentioning

confidence: 99%

“…They are formed when the macroparticles that are not tightly adhesive to the surface are detached by ion bombardment. [15][16] Fig. 2a gives the results of TiN films deposited at various biases.…”

Section: Surface Morphologymentioning

confidence: 99%

Microstructure and properties of TiCrN coatings by arc ion plating

Huang

Chen

Wang

et al. 2016

Surface Engineering

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“…Transition metal nitride (TMN) films fabricated by physical vapor deposition have attracted a considerable amount of attention because of their exceptional properties [1]. TiN films, which have been broadly researched, are nowadays widely used in industry of cutting tools and as a material in prosthetics manufacture.…”

Section: Introductionmentioning

confidence: 99%

Structure and Tribomechanical Properties of TiZrSiN Nanostructured Thin Films Deposited by Reactive Magnetron Sputtering

Пилько¹,

Komarov²

2018

AM&T

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For the first time, the structure and tribomechanical properties of TiZrSiN nanostructured thin films deposited by reactive magnetron sputtering have been investigated as a function of nitrogen content. Sputtering was performed using two targets of different composition: Ti 0.56 Zr 0.36 Si 0.08 and Ti 0.36 Zr 0.56 Si 0.08 at. %. Three various types of TiZrSiN nanocomposite, formed with nitrogen deficient, nearly stoichiometric, and over stoichiometric nitrogen concentrations have been studied. Structural properties and composition of coatings were analyzed using SEM, EDX, XRD and RBS techniques. Tribomechanical properties were investigated by means of indentation, using Oliver and Pharr method, and scratch tests. The results showed that the tribomechanical properties are closely correlated with both the compositional and the structural modifications of TiZrSiN coatings induced by the addition of nitrogen in different concentrations. Thus, depending on coating composition and nitrogen content the deposited films exhibit hardness values ranged from 16 to 32 GPa. The results are intensively discussed and suggestions, explaining the influence of nitrogen concentration on structural and tribomechanical properties are made.

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Effect of carbon content on nanostructural, mechanical and electrochemical characteristics of self-organized nc-ZrCN/a-CNx nanocomposite films

Zhou

Liao

et al. 2015

Applied Surface Science

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Deposition and characterization of Ti–Cx–Ny nanocomposite films by pulsed bias arc ion plating

Cited by 8 publications

References 29 publications

Microstructure and properties of TiCrN coatings by arc ion plating

Microstructure and properties of TiCrN coatings by arc ion plating

Structure and Tribomechanical Properties of TiZrSiN Nanostructured Thin Films Deposited by Reactive Magnetron Sputtering

Effect of carbon content on nanostructural, mechanical and electrochemical characteristics of self-organized nc-ZrCN/a-CNx nanocomposite films

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