Deposition by reactive ion-plasma sputtering and characterization of CN thin films

Новиков, Н. В.; Voronkin, M. A.; Smekhnov, A. A.; Zaika, N.I.; Zakharchuk, A. P.

doi:10.1016/0925-9635(94)05311-1

Cited by 31 publications

(6 citation statements)

References 7 publications

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“…The case of nanotube growth during exposures of graphite to nitrogen might not be that different from the deposition of nanostructured microparticles in hydrogen and hydrogen-argon atmosphere. Nitrogen chemically sputters carbon atoms in the form of volatile molecules [85,86,87,88,89,90,91,92,93] that can then be trapped by the dense plasma beam. Similarly to the case of microparticle formation, the plasma-exposed graphite surface is a source of carbon for nanostructure formation.…”

Section: Discussion and Outlookmentioning

confidence: 99%

Spontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas

Bystrov¹,

Sanden²,

Arnas³

et al. 2014

Carbon

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We have investigated the formation of various carbon nanostructures using extreme plasma fluxes up to four orders of magnitude larger than in conventional plasma-enhanced chemical vapor deposition processing. Carbon nanowalls, multi-wall nanotubes, spherical nanoparticles and nanotips are among the structures detected with electron microscopy methods. Precursor injection or surface pretreatment were not required for the synthesis of the nanostructures. Preliminary experiments with varied plasma composition, sample bias and surface temperature have demonstrated the potential for optimizing the growth of the nanostructures in the current experimental setup .

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Section: Discussion and Outlookmentioning

confidence: 99%

Spontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas

Bystrov¹,

Sanden²,

Arnas³

et al. 2014

Carbon

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show abstract

“…The strong absorption between 2900 and 3250 cm −1 corresponds to the vibration of CH n ͑n =1,2,3͒ and even NH 2 bonds too ͑see inset of Fig. 12͒, whereas the region between 3200 and 3500 cm −1 indicates the presence of mostly NH bonds 59,60 and at higher energy ͑Ͼ3500 cm −1 ͒ it is contribution of O 2 , which is due to contamination of the films from the environment. The presence of "NH" bond intensity is used to study the degree of attachment of H to C or N sites.…”

Section: Fourier Transform Infrared "Ftir… Analysismentioning

confidence: 99%

Spectroscopic analysis of a-C and a-CNx films prepared by ultrafast high repetition rate pulsed laser deposition

McCann

Roy

Papakonstantinou

et al. 2005

Journal of Applied Physics

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The effect of nitrogen partial pressure on amorphous carbon nitride (a-CNx) (0.0⩽x⩽0.17) and laser fluence on amorphous carbon (a-C) films prepared by ultrafast high repetition rate pulsed laser deposition has been studied. The chemical bonding structure of the films was investigated by x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and Fourier transform infrared (FTIR) analysis. XPS studies of films revealed an increase in the CN sites at the expense of CC bonded carbon sites as nitrogen content in the films increased. Films (a-C) prepared as a function of laser fluence showed an increase in sp3-bonded carbon as laser fluence was increased from 0.36 to 1.7J∕cm2. The ID∕IG ratio and G peak position increased as a function of nitrogen whereas the full width at half maximum (FWHM) of the G peak decreased. This is indicative of either an increase in the size or number of the sp2 sites. Films prepared as a function of laser fluence revealed a decrease of the ID∕IG ratio and an increase in the FWHM of the G peak. The use of two visible excitation wavelengths when analyzing the samples indicated a resonant process. FTIR analysis revealed an increase in the peaks attributed to CN bonds as well as indicated a tiny amount of CN bonds within the nitrogen-doped films. Additionally, surface morphology analysis showed a greater particle density on films prepared at the highest laser energy in comparison to those prepared at lower fluences. Film hardness characterized by nanoindentation revealed that films became softer as a function of nitrogen content.

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“…This increase has also been found in other IR data. 15,17,60 There is movement of the peak at 2480-2337 cm −1 , but this cannot be assigned to a specific bonding environment. Finally, we can assign the peak at ∼3000 cm −1 to C-H stretches with approximately the same position and intensity for both samples, and then there is a small peak in both samples at ∼3300 cm −1 , which we can assign to NH 2 stretches.…”

Section: C-c Stretchingmentioning

confidence: 91%

Structure of a-C:N:H prepared from ammonia

2005

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A range of nitrogen-doped amorphous hydrogenated carbon samples (a-C:N x :H, where x ‫ס‬ 3 at.% and x ‫ס‬ 7 at.%) have been studied using neutron diffraction, inelastic neutron scattering (INS) and Fourier transform infra-red (FTIR) spectroscopy to obtain detailed information about their atomic-scale structure, particularly the bonding environment of the hydrogen. The results show that the overall atomic scale network structure of the two samples is very similar; however, the hydrogen-bonding sites alter subtly as the nitrogen content of the samples is increased.

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Deposition by reactive ion-plasma sputtering and characterization of CN thin films

Cited by 31 publications

References 7 publications

Spontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas

Spontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas

Spectroscopic analysis of a-C and a-CNx films prepared by ultrafast high repetition rate pulsed laser deposition

Structure of a-C:N:H prepared from ammonia

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