Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS)

Abstract

Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process. When depositing electrically non-conductive oxide ceramics as coatings with HiPIMS without dual magnetron sputtering (DMS) or mid-frequency (MF) sputtering, the growing coating leads to increasing electrical insulation of the anode. As a consequence, short circuits occur, and the process breaks down. This phenomenon is also known as the disappearing anode effect. In this study, a new approach involving adding electrically conductive carbide ceramics was tried to prevent the electrical insulation of the anode and thereby guarantee process stability. Yttria-stabilized zirconia (3YSZ) with 30 vol.% titanium carbide (TiC) targets are used in a non-reactive HiPIMS process. The main focus of this study is a parameter inquisition. Different HiPIMS parameters and their impact on the measured current at the substrate table are analyzed. This study shows the successful use of electrically conductive carbide ceramics in a non-conductive oxide as the target material. In addition, we discuss the observed high table currents with a low inert gas mix, where the process was not expected to be stable.

Fractal Analysis on Surface Topography of Thin Films: A Review

“…In 1999, high power pulsed/impluse magnetron sputtering technology was proposed by Kouznetsov et al [70], which combined the advantages of high intensity arc technology and magnetron sputtering, attracting attention for its high metal ionization rate. High power impluse magnetron sputtering can improve film quality, reduce surface roughness [71], intensify adhesion of film and increase hardness and strength [72].…”