Deposition of Amorphous Titanium Oxide Films Using Alkoxy(pyrazolylborate) Titanium (IV) Compounds

Plappert, Elisabeth Charlotte; Dahmen, K. H.; Hauert, Roland; Ernst, Karl Heinz

doi:10.1002/(sici)1521-3862(199903)5:2<79::aid-cvde79>3.0.co;2-m

“…XPS analysis of the surfaces of the specimens clarified that there appear the peaks assigned to titanium core-level spectra (Ti2p) after the TiO 2 -coating, while it is hard to detect the existence of titania phase by TF-XRD. XPS of Ti2p and oxygen core-levels (O1s) show binding energies associated with those found for anatase [8], for all the studied specimens. This means that all the surface of the polymer could be covered with Ti-OH groups with anatase-like structure.…”

Section: Key Engineering Materials Vols 254-256supporting

confidence: 59%

Bonelike Apatite Formation on Synthetic Organic Polymers Coated with TiO<sub>2</sub>

Kawashita¹,

Balas

²

,

Kim

³

et al. 2003

KEM

0

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Synthetic organic polymers were modified with silane-coupling agents, subsequently coated with hydrated titania abundant in Ti-OH group, to produce novel materials with bone-bonding property, i.e. bioactivity. Formation of bonelike apatite layer on the modified polymers was examined using a simulated body fluid (SBF). The apatite formation in SBF was induced on the surface of silane-coupled and TiO 2 -coated substrates, within two days, irrespective of the types of polymers among PET, EVOH, Nylon 6 and Nylon 6/6. Consequently, these surface modifications provide organic polymers with the inductive effect of apatite nucleation in SBF, regardless of their structures or compositions.

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Metallic Materials Deposition: Metal‐Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal–Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.

Winter

¹

,

Zheng

²

,

El‐Kaderi

³

2005

Encyclopedia of Inorganic Chemistry

0

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This review describes metal‐organic precursors for the growth of metal‐containing thin films by chemical vapor deposition methods. The major emphasis is on precursors that have been reported since 1994, and corresponds to a time of major growth in this field. Progress in the development of metal‐organic precursors is documented for the main group, lanthanide, and group 4–11 elements. In the main group elements, there has been considerable research activity directed toward the identification of strontium and barium precursors, due both to the technological importance of mixed oxide phases and the inherent difficulties in obtaining volatile, complexes of these large metal ions. Aluminum, gallium, and indium have also been the subject of intense investigation, owing to the importance of many phases containing these elements. The group 4 and 5 elements titanium, zirconium, hafnium, niobium, and tantalum have been the subject of considerable precursor development activity, owing to the importance of several mixed oxide phases and the importance of zirconium and hafnium oxide for high permittivity gate materials in microelectronics devices. Growth of metal nitride films of these elements has also been an active area of research for use as barrier materials in microelectronics devices. The deposition of copper metal films from metal‐organic precursors is driven by the urgent need for copper metallization procedures in microelectronics device manufacturing. The current state of metal‐organic precursor development is presented for each of the other metallic elements.

show abstract

Metallic Materials Deposition: Metal‐Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal–Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.

Winter

¹

,

Zheng

²

,

El‐Kaderi

³

2005

Encyclopedia of Inorganic and Bioinorganic Chemistry

0

View full text Add to dashboard Cite

This review describes metal‐organic precursors for the growth of metal‐containing thin films by chemical vapor deposition methods. The major emphasis is on precursors that have been reported since 1994, and corresponds to a time of major growth in this field. Progress in the development of metal‐organic precursors is documented for the main group, lanthanide, and group 4–11 elements. In the main group elements, there has been considerable research activity directed toward the identification of strontium and barium precursors, due both to the technological importance of mixed oxide phases and the inherent difficulties in obtaining volatile, complexes of these large metal ions. Aluminum, gallium, and indium have also been the subject of intense investigation, owing to the importance of many phases containing these elements. The group 4 and 5 elements titanium, zirconium, hafnium, niobium, and tantalum have been the subject of considerable precursor development activity, owing to the importance of several mixed oxide phases and the importance of zirconium and hafnium oxide for high permittivity gate materials in microelectronics devices. Growth of metal nitride films of these elements has also been an active area of research for use as barrier materials in microelectronics devices. The deposition of copper metal films from metal‐organic precursors is driven by the urgent need for copper metallization procedures in microelectronics device manufacturing. The current state of metal‐organic precursor development is presented for each of the other metallic elements.

show abstract

Deposition of Amorphous Titanium Oxide Films Using Alkoxy(pyrazolylborate) Titanium (IV) Compounds

Cited by 13 publications

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Bonelike Apatite Formation on Synthetic Organic Polymers Coated with TiO<sub>2</sub>

Bonelike Apatite Formation on Synthetic Organic Polymers Coated with TiO<sub>2</sub>

Metallic Materials Deposition: Metal‐Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal–Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.

Metallic Materials Deposition: Metal‐Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal–Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.

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