Deposition of anti‐fog coatings on glass substrates using the jet of an open‐to‐air microwave argon plasma at atmospheric pressure

Abstract

This study reports a one‐step process for the formation of anti‐fog coatings on commercial glass substrates using the jet of an open‐to‐air microwave argon plasma at atmospheric pressure with hexamethyldisiloxane (HMDSO) as the precursor for plasma‐enhanced chemical vapor deposition. Optical microscopy and broadband light transmittance measurements revealed significant precursor fragmentation and gas phase association reactions when HMDSO was injected close to the tube outlet, resulting in powder‐like, hydrophobic, and semiopaque glass surfaces. On the contrary, injection of HMDSO close to the substrate led to smoother, homogeneous, hydrophilic, and transparent glass surfaces. In addition, transmittance measurements at 590 nm in humid air according to American Society for Testing and Materials standard tests revealed superior anti‐fogging properties to plasma‐treated glass substrates. On the basis of the optical emission and absorption spectroscopy measurements, electrons, metastable argon atoms, and hot neutral argon atoms were mostly responsible for the significant precursor fragmentation close to the tube outlet, whereas the contribution of hot neutrals and ultraviolet photons became important close to the substrate.

High Performance Power Supplies for Plasma Materials Processing

“…for glasses) [4], anti-reflective coatings on glass surfaces (e.g. for architectural glass) [5] or reflective surface manufacturing (e.g. for industrial mirrors) [6].…”

Optical response of plasmonic silver nanoparticles after treatment by a warm microwave plasma jet

“…The flow of air was directed in such a way that it did not perturb the expansion of the plasma jet. Under such conditions, the plasma expanded beyond the end of the discharge tube [42,47,48] and thus, interacted with the grounded aluminum substrate holder (dimensions of 113 × 63 mm 2 ) placed in line with the tube outlet (see figure 1(b)). In this study, the distance between the tube outlet and the substrate surface was fixed at 10 mm.…”

“…Inspired by plasma sintering studies realized at high temperatures [40], this work explores the effect of a scanning open-to-air microwave argon plasma jet on the morphology and composition of thin films made of spin-coated Ag NPs (70-80 nm). Unlike the cold, atmospheric-pressure plasma jet treatment recently examined by Sonawane et al [37], the microwave plasma jet used in this study is characterized by relatively high neutral gas temperatures in the range of 2000-2400 K [41,42]. The effect of conventional thermal annealing (1300 K, 30 min) on the nanoparticles is also analyzed for comparison.…”

A novel two‐dimensional atmospheric pressure plasma jet device

“…Besides, the energy efficiency is improved significantly compared with other reports. [29,30] Finally, the array configuration of MW-APPJs can be used to generate a large area 2D plasma jet.…”