Metal oxide coatings have a variety of applications in industrial processes. As some of them have bio‐sensitive properties there is growing interest for their use in medical applications as well. Thus, the development of suitable deposition techniques is of major importance for these purposes. From these techniques plasma deposition at atmospheric pressure offers a promising approach as there is no need for vacuum systems accompanied by lower costs, less process time, and easier integration into existing process chains. In order to optimize the coating process, a good knowledge of the plasma is needed. In this work, we present investigations on the plasma properties performed by systematic optical emission spectroscopy (OES) measurements.