2020
DOI: 10.1016/j.ceramint.2019.10.179
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Deposition of boron-containing coatings by electron-beam evaporation of boron-containing targets

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Cited by 19 publications
(12 citation statements)
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“…The duration of the entire process was 5 to 20 min depending on the target composition (B or BN). Simultaneously with the deposition of coatings, it was possible to monitor the mass-to-charge composition of the beam plasma using a modified RGA-300 quadrupole mass-spectrometer [139,140]. Figure 30 shows photographs of the obtained boron-based coatings at different electron-beam power densities, and the distribution of micro-hardness with the depth of the coatings deposited during evaporation of boron and boron nitride in different gases.…”
Section: Boron-containing Coatingsmentioning
confidence: 99%
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“…The duration of the entire process was 5 to 20 min depending on the target composition (B or BN). Simultaneously with the deposition of coatings, it was possible to monitor the mass-to-charge composition of the beam plasma using a modified RGA-300 quadrupole mass-spectrometer [139,140]. Figure 30 shows photographs of the obtained boron-based coatings at different electron-beam power densities, and the distribution of micro-hardness with the depth of the coatings deposited during evaporation of boron and boron nitride in different gases.…”
Section: Boron-containing Coatingsmentioning
confidence: 99%
“…Photographs of boron-based coatings at different electron-beam power densities:(a) 30 kW/cm 2 ; (b) 25 kW/cm 2 ; (c) 20 kW/cm 2 ; (d) 15 kW/cm 2 . Graphs[139] represent a microhardness of boron-containing coatings vs. depth during evaporation of boron in helium (e), oxygen (f), nitrogen (g), and of boron nitride in the residual atmosphere (h).…”
mentioning
confidence: 99%
“…The great advantage of this method is the possibility of carrying out the boronizing process locally on the selected surface of machine element [21,26,27]. In [28], Yushkov et al used electron-beam evaporation of boron-containing targets for boriding. The obtained coating thickness was 3-4 µm.…”
Section: Introductionmentioning
confidence: 99%
“…[ 12 ] However, with boron, the electron‐beam approach is hampered by the low electrical conductivity of boron, which in vacuum results in charging up of the target and even reflection of the electron beam. However, as we have shown in prior works, [ 13,14 ] dense boron‐containing plasma can be generated and used for coating deposition by electron‐beam evaporation of a boron‐containing target in medium vacuum (at pressure about 10 Pa) by a powerful continuous focused electron beam from a forevacuum pressure plasma‐cathode electron source. In the forevacuum pressure range, efficient heating and high evaporation rates of low conductivity targets can be attained via neutralization of target surface charging by ions of the plasma formed from the working gas by the electron beam in the vicinity of the target (the “beam plasma”).…”
Section: Introductionmentioning
confidence: 99%