Hybrid electro-electroless deposition (HEED) is a process defined as the electrochemical reduction of separate and distinct metals or alloys by independent electrochemical processes within a single electrolyte. The present Co/(Ni-P) system is composed of two phases, electroplating and electroless deposition, which each target a different metal ion within the electrolyte. Electroplating produces majority Co films, over 60 % atomically, with the concentration of Ni-P depending on the electrolyte composition and deposition conditions. The electroless deposition phase, carried out within the same electrolyte, produces nearly pure Ni-P deposits, estimated at <2 % Co. The low Co content within electrolessly deposited films is due to the acidity of the electrolyte which prevents the codeposition of Co. A combination of electrolyte factors, including metal ion ratio, temperature, acidity, and applied potential, control the composition purity of HEED films by controlling the rate of ongoing electroless deposition.