2002
DOI: 10.1016/s0042-207x(02)00235-x
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Deposition of composite and nanolaminate ceramic coatings by sputtering

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Cited by 41 publications
(21 citation statements)
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“…This volume increase may cause high residual stress and even lead to delamination of ZrO 2 coatings from the substrate. Hence the high temperature phases (tetragonal and cubic) are important to be stabilised down to room temperature for many high temperature applications [4][5][6]. The main approach adopted for this purpose is to dope zirconia with trivalent (Y 2 O 3 ) or divalent (CeO 2 ) cations or controlling the crystallite size of the high temperature phase (tetragonal) within few nm.…”
Section: Introductionmentioning
confidence: 99%
“…This volume increase may cause high residual stress and even lead to delamination of ZrO 2 coatings from the substrate. Hence the high temperature phases (tetragonal and cubic) are important to be stabilised down to room temperature for many high temperature applications [4][5][6]. The main approach adopted for this purpose is to dope zirconia with trivalent (Y 2 O 3 ) or divalent (CeO 2 ) cations or controlling the crystallite size of the high temperature phase (tetragonal) within few nm.…”
Section: Introductionmentioning
confidence: 99%
“…Sputtering has been shown to be successful in the controlled synthesis of both novel phases and thin film microstructures in the alumina-zirconia system [5][6][7][8][9][10][11][12]. The metastable tetragonal phase of zirconia has, for instance, been deposited in a nanolaminated structure through reactive radio-frequency (RF) diode sputtering [5][6][7][8][9][10] and DC reactive magnetron sputtering [11,12] at temperatures between room temperature and 290°C.…”
Section: Introductionmentioning
confidence: 99%
“…The metastable tetragonal phase of zirconia has, for instance, been deposited in a nanolaminated structure through reactive radio-frequency (RF) diode sputtering [5][6][7][8][9][10] and DC reactive magnetron sputtering [11,12] at temperatures between room temperature and 290°C. The presence of the tetragonal phase was, however, dependant on the thickness of the layers, noting that the alumina phase remained amorphous.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 3 shows the cross sectional view of the nanolaminate and formation of island growth of the film. Teixeira et al [20], deposited ZrO2/Al2O3 nanolayers films by DC reactive magnetron sputtering with O2 and Ar gas mixture, at constant temperature, bias and work pressure. They reported that the high temperature tetragonal phase content increased as the nanolayers get thinner.…”
Section: Resultsmentioning
confidence: 99%