Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering

Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use

“…The leakage current test of insulators with and without deposition was also performed before and after being subjected to artificial salt spray weathering for alternating current systems with nominal voltages higher than 1000 V [13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29] .…”

“…Such coatings can alter the wetting properties of the surface formed once the OH -groupings are substituted. Additionally, titanium films have high mechanical strength, excellent thermal stability and good corrosion resistance in highly aggressive environments [18][19][20] . In processes that involve cold plasmas, some determining factors must be defined: the energy source, feed system and the choice of the precursor gases, reactor type and the types of substrates, with the latter and the geometric factors related to the surroundings of the plasma phase being crucial to the efficiency of these processes 21 .…”

Optical Properties of Titanium in the Regime of the Limited Light Penetration

“…The microstructural and optical properties of the materials synthesized in the vacuum chamber strongly depend on the growing conditions (e.g., a pressure of working/reactive gas, deposition rate, substrate temperature, and the bias applied) [1]. There are various methods used to increase energy of condensed particles, e.g., heating of the substrate (and/or post-deposition annealing) [2,3], plasma bombardment [4], increasing of the power of the supplier [3,5]. Sometimes the additional voltage, the bias, is applied during the coating formation process [4,6,7].…”

“…There are various methods used to increase energy of condensed particles, e.g., heating of the substrate (and/or post-deposition annealing) [2,3], plasma bombardment [4], increasing of the power of the supplier [3,5]. Sometimes the additional voltage, the bias, is applied during the coating formation process [4,6,7]. Those methods lead to increasing the kinetic energy of particles dissipated due to the inter-particle collisions.…”

“…The aim of this work is to examine the influence of the thickness of titanium films (from 12 nm to 1470 nm) formed using the GIMS method on their microstructure, optical and electrical properties. It should be noted that microstructural properties of Ti coatings prepared under different conditions and using various modifications of magnetron sputtering methods are described in literature [2][3][4][5][6][7][18][19][20][21]; however, their optical constants and/or opto-electronic properties are described only in a few publications [20,[22][23][24]. Additionally, the results related to the optical constants of Ti can b found in Reference [12,14,15].…”