2014
DOI: 10.1016/j.tsf.2014.03.026
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Deposition of fluorocarbon film with 1,1,1,2-tetrafluoroethane pulsed plasma polymerization

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Cited by 8 publications
(6 citation statements)
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“…Low‐pressure plasma deposition of fluorocarbon films has been widely studied in the last decades . The main goal of those works was to evaluate the capability of tuning the chemistry of the coatings by controlling parameters such as the plasma source or the feed gases (monomers and additives).…”
Section: Introductionmentioning
confidence: 99%
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“…Low‐pressure plasma deposition of fluorocarbon films has been widely studied in the last decades . The main goal of those works was to evaluate the capability of tuning the chemistry of the coatings by controlling parameters such as the plasma source or the feed gases (monomers and additives).…”
Section: Introductionmentioning
confidence: 99%
“…Low-pressure plasma deposition of fluorocarbon films has been widely studied in the last decades. [1][2][3][4][5][6] The main goal of those works was to evaluate the capability of tuning the chemistry of the coatings by controlling parameters such as the plasma source or the feed gases (monomers and additives). For instance, gaseous precursors such as C2F6, C3F8, and C4F8 were studied in continuous wave, pulsed, and downstream radio-frequency plasmas.…”
Section: Introductionmentioning
confidence: 99%
“…In PECVD deposition, various radicals can be formed as the gas bonds are broken. There is a relationship between rf-power increase and bond breaking, giving rise to different radicals 48 . As the bond-breaking intensifies, the formation of cross-links in the film structure increases, so a broadening of the peak at 1200 cm -1 occurs, due to vibrational modes of the bonds of the various radicals CF, CF 2 , and CF 3 .…”
Section: Resultsmentioning
confidence: 99%
“…For the reaction, a 5/95 ms pulse sequence was used, which means that the plasma was on for 5 ms and then off for 95 ms for the whole pulsed experiment. To achieve this pulse sequence, the duty cycle (defined as the ratio of pulse on time to the total cycle time 16 ) was chosen as 5%. Table 1 shows the process parameters of the plasma deposition system.…”
Section: Fabrication Of Super-hydrophobic Cotton Fabricsmentioning
confidence: 99%