Deposition of Gadolinia-Doped Zirconia Layers Using Metalorganic Compounds at Low Temperatures

Abstract

This paper shows the results of an investigation on the synthesis of non-porous and nanocrystalline ZrO2-Gd2O3 layers by metalorganic chemical vapor deposition (MOCVD) with the use of Zr(tmhd)4 (tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV)) and Gd(tmhd)3 (tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gadolinium(III)). Argon and air were used as carrier gases. The molar content of Gd(tmhd)3 in the gas reaction mixture was as follows: 10% and 20%. The layers were synthesized on tubular substrates made of quartz glass at the temperatures of 550–700 °C. Synthesis conditions were established using the Grx/Rex2 expression (Gr is the Grashof number; Re is the Reynolds number; x is the distance from the gas inflow point). The value of this criterion was below 0.01. ZrO2-Gd2O3 layers synthesized at 600–700 °C were crystalline. When the molar content of Gd(tmhd)3 in the gas reaction mixture was 10 mol.%, a relationship between the chemical composition of the gas reaction mixture and that of the deposited layer could be observed. The synthesized layers underwent scanning electron microscopy, as well as X-ray analysis. The transparency of coated and uncoated glass was tested using UV–Vis spectroscopy. Their chemical composition was examined with the use of an EDS analyzer.

Chemical Vapour Deposition of Scandia-Stabilised Zirconia Layers on Tubular Substrates at Low Temperatures

“…The results of the research conducted so far at the AGH University of Science and Technology (Faculty of Materials Science and Ceramics) in Krakow (Poland) confirm the high usefulness of this method for the synthesis of non-porous ceramic layers on tubular substrates at low temperatures. These results have been published recently in the papers, e.g., [ 52 , 53 , 54 , 55 , 56 , 57 ].…”