Careful analysis of the chemical state of Cu
x
Zn
1–
x
S thin films
remains
an underdeveloped topic although it is key to a better understanding
of the phase transformations and the linking between structural and
optoelectronic properties needed for tuning the performance of Cu
x
Zn
1–
x
S-based
next-generation energy devices. Here, we propose a chemical formulation
and formation mechanism, providing insights into the successive ionic
layer adsorption and reaction (SILAR) processing of Cu
x
Zn
1–
x
S, in which
the copper concentration directly affects the behavior of the optoelectronic
properties. Via chemical, optoelectronic, and structural characterization,
including quantitative X-ray photoelectron spectroscopy, we determine
that the Cu
x
Zn
1–
x
S thin films at low copper concentration are composed of ZnS,
metastable Cu
x
Zn
1–
x
S, and CuS, where the evidence suggests that a depth
compositional gradient exists, which contrasts with homogeneous films
reported in the literature. The oxidation states for copper and sulfide
species indicate that the films grow following a formation mechanism
governed by ionic exchange and diffusion processes. At high copper
concentrations, the Cu
x
Zn
1–
x
S thin films are covellite CuS that grew on a ZnS
seed layer. Hence, this work reiterates that future research related
to fine-tuning the application of this material requires a careful
analysis of the depth-profile compositional and structural characteristics
that can enable high conductivity and transparency.