2007
DOI: 10.1016/j.surfcoat.2007.07.058
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Deposition of in situ surface structured DLC-coatings

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Cited by 9 publications
(3 citation statements)
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“…The roughness will increase if the surface energy is high because the atoms need the high energy to agglomerate and form the film. Therefore, the final roughness of the DLC films is strongly dependent on the surface energy [35]. The result agrees well with the previous AFM results.…”
Section: Tablesupporting
confidence: 92%
“…The roughness will increase if the surface energy is high because the atoms need the high energy to agglomerate and form the film. Therefore, the final roughness of the DLC films is strongly dependent on the surface energy [35]. The result agrees well with the previous AFM results.…”
Section: Tablesupporting
confidence: 92%
“…If the surface energy is high, the roughness increases, because the atoms need the high energy to be leagued and to form the film. In this situation, the final roughness of the DLC films is strongly related to the surface energy [19,20].…”
Section: Resultsmentioning
confidence: 99%
“…To improve the scalability of the PACVD technology and to reduce the cleaning requirements due to deposits on the deposition chamber walls, a new reactor design is used that has been described in [9]. By splitting the plasma chamber into a reactive gas chamber made of insulating material and an inert gas chamber containing the counter electrode, contamination of the counter electrode with deposits from the process gas is avoided and a significantly more stable process can be achieved.…”
Section: A-c : H-coatings By Pacvdmentioning
confidence: 99%