Deposition of multicomponent chromium boride based coatings by pulsed magnetron sputtering of powder targets

Audronis, M.; Kelly, Peter; Arnell, R.D.; Leyland, A.; Matthews, A.

doi:10.1016/j.surfcoat.2005.08.089

Cited by 33 publications

(18 citation statements)

References 15 publications

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“…The peculiarity of the method that we have used to deposit these coatings results in some contamination of the coating at the beginning of the deposition process [1,2,4]. The presence of oxygen (particularly near the coating/substrate interface) has been shown by RBS analysis of CrB 2 and CrB coatings [1], and later by Auger electron spectroscopy of multi-elemental Cr-B-based films deposited from similar targets ( Fig.…”

Section: Effects Of Oxygen Contaminationmentioning

confidence: 95%

“…The contamination of the films by oxygen in the early stages of deposition is believed to be avoidable by implementing a longer "shutter closed" (i.e. target conditioning) time, prior to coating deposition [4].…”

Section: Effects Of Oxygen Contaminationmentioning

confidence: 99%

“…However, these properties depend strongly on the deposition process and parameters [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. To understand the relationships between these deposition parameters and the resulting properties requires detailed structural analysis of the films.…”

Section: Introductionmentioning

confidence: 99%

“…To understand the relationships between these deposition parameters and the resulting properties requires detailed structural analysis of the films. This understanding may give important information about the characteristics of the deposition processwhich in this particular case is a recently developed method involving magnetron sputtering of loosely packed powder (LPP) targets [1][2][3][4] -and then point to directions for improvement. The combination of a pulsed magnetron sputtering (PMS) process [5] with the use of blended powder targets is a new, highly flexible deposition tool, suitable for the development of novel physical vapour deposition (PVD) coating systems and the optimisation of film properties.…”

Section: Introductionmentioning

confidence: 99%

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Microstructure of direct current and pulse magnetron sputtered Cr–B coatings

et al. 2006

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Section: Effects Of Oxygen Contaminationmentioning

confidence: 95%

Section: Effects Of Oxygen Contaminationmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Microstructure of direct current and pulse magnetron sputtered Cr–B coatings

et al. 2006

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“…11 ), FeB, TiB2, CrB2 (ref. 12,13 ), as well as some hexaborides such asLaB6, CeB6, SmB6, YB6 (ref. [14][15][16] ).…”

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confidence: 99%

Sputtering of pure boron using a magnetron without a radio-frequency supply

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Anders

Nikolaev

et al. 2017

Review of Scientific Instruments

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Boron at room temperature is insulating and therefore conventionally sputtered using radiofrequency (RF) power supplies including their power-matching networks. In this contribution we show that through a suitable ignition assistance, via temporary application of a high voltage (~ 600 V) to the substrate holder or auxiliary electrode, the magnetron discharge can be ignited using a conventional mid-frequency power supply without matching network.Once the discharge is ignited, the assisting voltage can be reduced to less than 50 V, and after the boron target surface is at elevated temperature, thereby exhibiting sufficient conductivity, the assisting voltage can be turned off. The deposition of boron and boron nitride films has been demonstrated with a deposition rate of approximately 400 nm/h for a power of 250 W.

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A New Approach to the Deposition of Elemental Boron and Boron-Based Coatings by Pulsed Magnetron Sputtering of Loosely Packed Boron Powder Targets

Audronis

Kelly

Leyland

et al. 2007

Plasma Process. Polym.

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Large numbers of potential application areas for elemental boron and boron‐based thin film materials make this subject area a focus of significant scientific and industrial interest. Applications include thermoelectric energy conversion devices, biomedical implants, metalworking tools and automotive components. Boron is however also recognised widely to be a difficult‐to‐deposit material. Therefore, a new technique to deposit boron (and other boron‐based materials) by pulsed magnetron sputtering of loosely packed powder targets has been proposed. Among the benefits of this approach are: improved stability of the deposition process, increased speed and flexibility of target preparation, enhanced time‐ and cost‐effectiveness and the ability to control readily the target and hence the chemical composition of the coating.

show abstract

Deposition of multicomponent chromium boride based coatings by pulsed magnetron sputtering of powder targets

Cited by 33 publications

References 15 publications

Microstructure of direct current and pulse magnetron sputtered Cr–B coatings

Microstructure of direct current and pulse magnetron sputtered Cr–B coatings

Sputtering of pure boron using a magnetron without a radio-frequency supply

A New Approach to the Deposition of Elemental Boron and Boron-Based Coatings by Pulsed Magnetron Sputtering of Loosely Packed Boron Powder Targets

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