2006
DOI: 10.1007/s10582-006-0205-4
|View full text |Cite
|
Sign up to set email alerts
|

Deposition of nanolayers by means of dense plasma focus

Abstract: In our preliminary experiments, reported in this paper, dense plasma focus (DPF) device is used for deposition of thin (a few nanometers of thickness) chromium layers. Such films have been deposited on silicon wafers by ablation of the chromium target using highly dense and highly temperature argon-oxygen plasma. Two films with different structure were obtained at the same substrate temperature using a fixed shot number (equal to 7). Surface topology and depth profiles of the films were studied by means of sca… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2013
2013
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 8 publications
(1 citation statement)
references
References 9 publications
0
1
0
Order By: Relevance
“…The specimens were fitted into the holder in an offcenter position (20 • -40 • ) to the anode axis. The specimen holder was placed axially in front of the anode at a distance of 130 mm from the anodic gun [39,40]. The graphite solid rod (purity > 99.9%), was fitted in the center of the hollow anode tip to act as a precursor for the deposition of NDs on the PCL scaffold specimens.…”
Section: Nds Surface Deposition On 3d-printed Pcl Scaffold Specimensmentioning
confidence: 99%
“…The specimens were fitted into the holder in an offcenter position (20 • -40 • ) to the anode axis. The specimen holder was placed axially in front of the anode at a distance of 130 mm from the anodic gun [39,40]. The graphite solid rod (purity > 99.9%), was fitted in the center of the hollow anode tip to act as a precursor for the deposition of NDs on the PCL scaffold specimens.…”
Section: Nds Surface Deposition On 3d-printed Pcl Scaffold Specimensmentioning
confidence: 99%