Deposition of polysiloxane‐like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: characterization by XPS and contact angle measurements

Azioune, Ammar; Marcozzi, Michaël; Revello, V; Pireaux, Jean‐Jacques

doi:10.1002/sia.2563

Cited by 31 publications

(19 citation statements)

References 47 publications

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“…The preparation of SiO x C y H z layer was thus confirmed. The contact angle increased to ~ 87¡ after the PECVD deposition, highlighting a hydrophobic surface, in agreement with previous studies (Azioune et al, 2007;Yeo et al, 2006).…”

Section: ! Results and Discussionsupporting

confidence: 92%

Protein pattern transfer for biosensor applications

Volcke

Gandhiraman

Basabe‐Desmonts

et al. 2010

Biosensors and Bioelectronics

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This paper presents a very simple, industrially-scalable method for transferring a highresolution, biologically-active protein pattern from one substrate to another. We demonstrate the transfer of a protein pattern formed initially by microcontact printing from a silicon surface (to which this form of printing is applicable) onto a glass or polymer substrate, almost independently of the surface/bulk properties of the second substrate. A very thin, spin-coated layer of a sugar is used to preserve the structure and organization of proteins during the subsequent plasma deposition of a siloxane polymer, after which the protein pattern could simply be peeled off the silicon substrate and glued onto any other desired substrate.

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Section: ! Results and Discussionsupporting

confidence: 92%

Protein pattern transfer for biosensor applications

Volcke

Gandhiraman

Basabe‐Desmonts

et al. 2010

Biosensors and Bioelectronics

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“…In the case of g-FOTES, the C 1 s signal was a convolution of five components at 285.2 eV, originating from C-C and C-Si [44][45][46], and at 286.5, 291.5, 294.0, and 288.0 eV attributable to C-O [39], -CF 2 and -CF 3 groups [39,44,45], as well as a contamination component, respectively (Figure 4c). Two components for the Si 2p signal at 102.9 and 103.7 eV were ascribed to Si-C [47,48] and glass [49], as shown in Figure 4f.…”

Section: Resultsmentioning

confidence: 99%

Effects of Tailored Surface Chemistry on Desorption Electrospray Ionization Mass Spectrometry: a Surface-Analytical Study by XPS and AFM

Penna

Careri

Spencer

et al. 2015

J. Am. Soc. Mass Spectrom.

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Abstract. Since it was proposed for the first time, desorption electrospray ionizationmass spectrometry (DESI-MS) has been evaluated for applicability in numerous areas. Elucidations of the ionization mechanisms and the subsequent formation of isolated gas-phase ions have been proposed so far. In this context, the role of both surface and pneumatic effects on ion-formation yield has recently been investigated. Nevertheless, the effect of the surface chemistry has not yet been completely understood. Functionalized glass surfaces have been prepared, in order to tailor surface performance for ion formation. Three substrates were functionalized by depositing three different silanes [3-mercaptopropyltriethoxysilane (MTES), octyltriethoxysilane (OTES), and 1H,1H,2H,2H-perfluorooctyltriethoxy-silane (FOTES)] from toluene solution onto standard glass slides. Surface characterization was carried out by contact-angle measurements, tapping-mode atomic force microscopy, and X-ray photoelectron spectroscopy. Morphologically homogeneous and thickness-controlled films in the nm range were obtained, with surface free energies lying between 15 and 70 mJ/m 2 . These results are discussed, together with those of DESI-MS on lowmolecular-weight compounds such as melamine, tetracycline, and lincomycin, also taking into account the effects of the sprayer potential and its correlation with surface wettability. The results demonstrate that ionformation efficiency is affected by surface wettability, and this was demonstrated operating above and below the onset of the electrospray.

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“…Films deposited from the activation of precursors by glow discharges (PECVD) appears as in interesting alternative 4 since their physical and chemical properties can be tailored by the plasma excitation parameters 6 . The deposition process is free of toxic solvents and chromates 5,6 , dry, clean, fast, relatively inexpensive and easy to perform. Furthermore, it provides uniform, homogeneous and pinhole-free coatings, very convenient characteristics as one considers barrier properties.…”

Section: Introductionmentioning

confidence: 99%

“…Organosilicon to oxide films can be deposited by PECVD from hexamethyldisiloxane, HMDSO 5,[7][8][9] . The deposition kinetics is based on the HMDSO fragmentation and multiple step reactions in the plasma phase, providing precursors for film formation 7 .…”

Section: Introductionmentioning

confidence: 99%

“…The deposition kinetics is based on the HMDSO fragmentation and multiple step reactions in the plasma phase, providing precursors for film formation 7 . When O 2 is added to the vapor of HMDSO (HMDSO/O 2 ), organic constituents are scavenged from the films, increasing the inorganic character (SiO 2 -like) 5,10 of the structure. This change improves the film adhesion to aluminum substrates 6 and when associated with an increase in the plasma excitation power, produces relatively more cross-linked 11 and then denser structures, interesting features as one considers a barrier layer.…”

Section: Introductionmentioning

confidence: 99%

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Corrosion resistance of 2024 aluminum alloy coated with plasma deposited a-C:H:Si:O films

et al. 2014

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AA 2024 aluminum alloy is widely employed in aeronautic and automobilist industries. Its hardness and low density are attractive properties for such industrial areas. However, since it contains copper, it undergoes severe corrosion in aggressive media as saline or low Earth orbit environments. In this work, it was investigated the properties of films deposited by PECVD on AA 2024 aluminum alloy as well as the corrosion resistance of the film/substrate systems under different corrosive atmospheres. Films were prepared in a plasma atmosphere composed of 50% of oxygen and 50% of hexamethyldisiloxane resulting in a total gas pressure of 4.0 Pa. Plasma ignition was promoted by the application of radiofrequency signal (13.56 MHz) to the sample holder while grounding the topmost electrode. The plasma excitation power, P, was changed from 10 to 80 W in the six different set of experiments. Film thickness, measured by profilometer, increases by 5 times as P was elevated from 10 to 80 W. As demonstrated by the infrared spectra of the samples, films are essentially organosilicons with preservation of functional groups of the precursor molecule and with creation of different ones. The oxide proportion and the structure crosslinking degree are affected by the plasma excitation power. According to the results obtained by sessile drop technique, hydrophilic to moderately hydrophobic films are produced with changing P from 10 to 80 W. The corrosion resistance, evaluated by salt spray and electrochemical impedance spectroscopy, EIS, experiments, in general increases after film deposition. It is demonstrated that film deposition improves, in up to 36 times, the resistance of the alloy to salt spray attack. It is also shown an improvement of about 240 times in the alloy resistance under NaCl solution by the EIS data. Micrographs acquired by Scanning Electron Microscopy after the corrosion tests furnish further information on the importance of the layer physical stability on its barrier properties. Furthermore, films highly protect the alloy against the oxygen attack. Interpretations are proposed based on the modification of the plasma kinetics with P, altering film structure, composition and properties.

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Deposition of polysiloxane‐like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: characterization by XPS and contact angle measurements

Cited by 31 publications

References 47 publications

Protein pattern transfer for biosensor applications

Protein pattern transfer for biosensor applications

Effects of Tailored Surface Chemistry on Desorption Electrospray Ionization Mass Spectrometry: a Surface-Analytical Study by XPS and AFM

Corrosion resistance of 2024 aluminum alloy coated with plasma deposited a-C:H:Si:O films

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