Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System

Frey, Hartmut; Lauth, R; Khan, H. U.; Eisenreich, N.; Koleczko, Andrzej

doi:10.9734/psij/2017/33788

Cited by 3 publications

(7 citation statements)

References 33 publications

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“…The higher homologues of these compounds are seldom used, since they are difficult to handle and pyrophoric. However, the chemistry of hydridosilanes has received a considerable revival in recent years due to their potential use as precursors for liquid phase deposition of silicon films . This approach promises significant reduction of processing costs in the manufacture of semiconductor devices .…”

Section: Introductionmentioning

confidence: 99%

“…However, the chemistry of hydridosilanes has received a considerable revival in recent years due to their potential use as precursors for liquid phase deposition of silicon films. [4][5][6][7][8][9][10][11][12][13][14][15][16] This approach promises significant reduction of processing costs in the manufacture of semiconductor devices. [4,17,18,19] Printing techniques have been applied to produce silicon thin-film transistors (TFT).…”

Section: Introductionmentioning

confidence: 99%

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Syntheses and Molecular Structures of Liquid Pyrophoric Hydridosilanes

et al. 2020

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Trisilane, isotetrasilane, neopentasilane, and cyclohexasilane have been prepared in gram scale. In‐situ cryo crystallization of these pyrophoric liquids in sealed capillaries on the diffractometer allows access to the single crystal structures of these compounds. Structural parameters are discussed and compared to gas‐phase electron diffraction structures from literature and with the results from quantum chemical calculations. Significantly higher packing indices are found for the silanes compared to the corresponding alkanes. Radiation with ultraviolet light (365 nm) and parallel ESR (EPR) measurement shows that cyclohexasilane is easily split into radicals, which subsequently leads to the formation of branched and chain‐like oligomers. The other compounds form no radicals under these conditions. NMR spectra of all four compounds have been recorded.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Syntheses and Molecular Structures of Liquid Pyrophoric Hydridosilanes

et al. 2020

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“…The processing of both compounds into silicon films has already been described in a large number of publications. [1,10,85,6,86,9,87] In contrast to CPS, neopentasilane (NPS) must be irradiated with UV light of lower wavelengths (< 230 nm) [32] to polymerize it. NPS has been polymerized thermo- [7] and sonochemically.…”

Section: Conditions For Liquid Processing and Polymerization Of Hydro...mentioning

confidence: 99%

“…[5] From these, thin films can be prepared by a variety of deposition techniques, e. g. spin coating, [4,6,7] slot die coating, [7] inkjet or other printing processes [1,8] and spraying methods. [9] The film deposition follows a thermal conversion to a very pure amorphous silicon (a:Si) layer at comparatively low temperatures between 300 and 500 °C. [10] The a:Si layers can be processed to electronic devices like transistors directly [10,11] or crystallized by further heating or laser treatment to obtain a polycrystalline silicon (poly-Si) layer, which is further processed.…”

Section: Introductionmentioning

confidence: 99%

Challenges in the Synthesis and Processing of Hydrosilanes as Precursors for Silicon Deposition

Gerwig,

Böhme,

Friebel

2024

Chemistry A European J

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Liquid hydrosilanes are required for the production of silicon films. The silicon layers can be processed for electronic devices like transistors or thin‐film solar cells. Hydrosilanes are highly reactive and pyrophoric. Therefore, the synthesis of these compounds is challenging and dangerous. The available synthesis methods for hydrosilanes are reviewed and compared.Hydrosilanes are highly attractive compounds, which can be processed as liquids with printing technology to amorphous silicon films on nearly any solid substrate. The silicon layers can be processed for electronic devices like transistors or thin‐film solar cells. The endothermic character of hydrosilanes with their positive enthalpies of formation results in favorable properties for processing. The larger the molecules, the lower their decomposition temperature and the higher their photoactivity. Cyclic hydrosilanes such as cyclopentasilane and cyclohexasilane can be easily deposited. The branched neopentasilane is more difficult to deposit but yields better‐quality films after processing.The key challenge is the complex synthesis of the precursors and the hydrosilanes. The available preparative methods are presented in this review and their advantages and disadvantages are evaluated. The following synthesis methods are presented and discussed in this article: Wurtz coupling and other reductive coupling processes, dehydrogenative coupling of silanes, plasma synthesis of chlorinated polysilanes, amine‐ or chloride‐induced disproportionations, and transformation of monosilane to higher silanes.Plasma synthesis is already carried out today as a continuous industrial process. The most effective synthesis methods in the laboratory are currently amine‐ and chloride‐induced disproportionations. There is a great need to further optimize the syntheses of hydrosilanes and to develop new simple synthesis variants.

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“…The formulation of prepolymerized dihydrosilanes benefits from an addition of pure CPS. [ 2 ] Deposition of silane inks has been demonstrated by spin coating [ 5,7,9 ] spray coating [ 20 ] slot‐die coating, [ 9 ] and ink‐jet printing [ 2,21 ] (step II). Layers as thick as 300 nm were realized by doctor blading of pure CPS.…”

Section: Introductionmentioning

confidence: 99%

From Cyclopentasilane to Thin‐Film Transistors

Gerwig

Ali

Neubert

et al. 2020

Adv Elect Materials

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Cyclopentasilane (CPS) has been studied as an liquid precursor for the deposition of thin silicon films for printed electronics and related applications. The processing involves a UV‐induced prepolymerization of CPS followed by liquid deposition and low‐temperature thermolysis. An insight into the oligomer and polymer formation including crosslinking in solution using 29Si NMR spectroscopy and electron spin resonance spectroscopy is reported. Formation of SiH (T‐units) and SiH3 (M‐units) is observed as well as short‐lived paramagnetic species. Additionally, the polymerization is followed by Raman spectroscopy. Reactive molecular dynamics simulations are applied to develop a theoretical model for the CPS‐ring‐opening and crosslinking steps. The experimental and computational data correspond well to each other and allow insight into the mechanism of polymer formation. The processing steps include spin‐coating, thermal drying, and conversion to amorphous silicon, H‐passivation, and fabrication of a CPS‐derived thin‐film transistor (TFT), without intermediate silicon crystallization. Further improvement is gained by using tetralene as a solvent, leading to a reduction of the time‐consuming polymerization step by one order of magnitude compared to cyclooctane. The overall quality and characteristics of the CPS‐derived spin‐coated silicon thin films correspond to standard plasma enhanced chemical vapor deposition‐derived devices with respect to performance levels.

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Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System

Cited by 3 publications

References 33 publications

Syntheses and Molecular Structures of Liquid Pyrophoric Hydridosilanes

Syntheses and Molecular Structures of Liquid Pyrophoric Hydridosilanes

Challenges in the Synthesis and Processing of Hydrosilanes as Precursors for Silicon Deposition

From Cyclopentasilane to Thin‐Film Transistors

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