Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

Abstract

In this paper SiO x thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiO x thin films were deposited at different oxygen concentrations in the Ar+O 2 plasma forming gas. After deposition processes, SiO x thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O 2 increased the bond strength to (32.8 ± 5.4) MPa. This value has not been achieved by traditional methods.

Ceramic Primer Heat-Treatment Effect on Resin Cement/Y-TZP Bond Strength

“…18,19 Several techniques to improve this bond resistance have been reported in the literature, and the use of advanced technologies and chemical modification of the ceramic surface have demonstrated some success at improving the bond strength. The use of film deposition, 20,21,22 selective infiltration etching as a surface pretreatment, nanostructural alumina coating of the Y-TZP surface, or the addition of glass ceramics to the internal region of the zirconia-based ceramics in order to improve bond resistance and permit the use of conventional silane treatment have all been reported. 23,24,25 Other studies have been trying to find alternative adhesion approaches that are functional in the working environment.…”

Adhesion to Zirconium Dioxide Used for Dental Reconstructions: Surface Conditioning Concepts, Challenges, and Future Prospects

“…Alternative surface modification methods such as selective infiltration etching (SIE) [13,14], glaze ceramic coating [15], chemical plasma vapor deposition using hexamethyldisiloxane or chlorosilane gas [16], erbiumdoped yttrium aluminum garnet (Er: YAG) laser application [15,18] and physical vapor deposition using a magnetron sputtering technique (RMS) [19,20] have also been tried in an attempt to improve adhesion to zirconia. In the SIE method, low temperature fused glass ceramic is applied to the selected surface that is then etched with 5% HF solution.…”

“…Similarly, RMS method is based on deposition of high-energy particles on solid surfaces creating free radicals. The released particles scatter through the plasma of the inert gas at low pressure, depositing a uniform and controlled film and activating the substrate for improved adhesion without compromising the mechanical properties of the substrate [19,20]. 6 One other method known as Er:YAG laser ablation uses laser irradiation that creates a rough zirconia surface [17,18].…”

Silica coating followed by heat‐treatment of MDP‐primer for resin bond stability to yttria‐stabilized zirconia polycrystals

“…Therefore, several studies have pointed out that the adhesion to zirconia is somewhat weak and unstable . Hence, zirconia surface treatment such as Al 2 O 3 particle air‐abrasion, tribochemical silica coating, Er:YAG laser, primer application, Al 2 O 3 air‐abrasion followed by primer application, silica nanofilm deposition, and application of a thin layer of glassy material have been used to achieve higher and stable bonding to resin cements . Thus, tribochemical silica coating has been considered as a gold‐standard method, because it guarantees mechanical roughness and also surface coating through a silica layer deposition .…”