Deposition of Ti–Si–N films on Al substrates by magnetron sputtering

Abstract

The objective of this work is to settle the problem of adhesion between hard films and soft metal substrates. Hard Ti-Si-N films were deposited onto soft Al substrates with a double target magnetron sputtering system. The composition, structure, surface morphologies and mechanical properties were characterised by electron probe microanalyser, X-ray diffraction, atomic force microscope, scratch test and nanoindentation respectively. The as-deposited films had good adhesion to the Al substrates and had a smooth and lustrous surface. The maximum hardness of the films achieved was as high as 27?2 GPa at the Si target power of 80 W.

Investigation of monolayer–multilayer PVD nitride coating

“…Operating temperature throughout the sputtering process is higher due to high energy associated with unbalance magnetron sputtering. 31,32 Before deposition the specimens were mirror polished (1 μm diamonds) with surface roughness value of 8 nm, ultrasonically cleaned in acetone for 5 min and dried it for ∼20 min in a vacuum dryer. The coatings were deposited at 300°C, the dc substrate bias voltage was −75 V. N 2 and Ar flows were independently controlled using a mass flow controller.…”

Microstructure and multifunctional properties of Ti–Si–B–C coatings by plasma-enhanced chemical vapour deposition

“…Additionally, a high temperature oxidation resistance is necessary, on account of the high temperatures that may be generated at the cutting edge during the machining and the overall effects of a temperature-accelerated environment. As Si is added into Ti-based hard coatings, such as Ti–Si–N, 7,8 Ti–Si–C 9 and Ti–Si–B–N, 10,11 hardness, wear resistance and oxidation resistance were all improved by SiNx- and/or SiC phase on the top layer. Although the Ti–B–C coatings have some excellent properties, they are not as useful in tough working environments that include high speeds and/or high temperatures, because of their ease of oxidation at low temperatures below 600°C.…”

Optimisation of tribological performance of sputtering Zr/ZrC coatings

“…Over the last 50 years, many processes have been developed to improve surface properties that use various advanced techniques, such as vacuum arc deposition, magnetron sputtering, pulse laser deposition and ion beam assisted deposition, [14][15][16][17][18][19] all of which have been used to grow hard coatings during the last decade. Each of these techniques is designed for specific materials and for specific applications.…”