Deposition of TiB2 at low temperature with low residual stress by a vacuum arc plasma source

Treglio, James R.; Trujillo, S.; Perry, A.J.

doi:10.1016/0257-8972(93)90245-j

Cited by 29 publications

(8 citation statements)

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“…11 Hypothetical routes for improving the process stability has been suggested as follows: adding carbon into the cathode, applying a "suitable" magnetic field, or working in a reactive atmosphere, 11 or to simply use pulsed arc at the expense of, e.g., a high deposition rate. 12 These routes remain to be confirmed, although a stable arc process has been reported for the use of a TiB 2 cathode in N 2 for synthesis of nitride multielement alloys. 13 In this letter, we have explored conditions allowing the stable vacuum arc plasma generation from a TiB 2 cathode.…”

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Vacuum arc plasma generation and thin film deposition from a TiB₂cathode

et al. 2015

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We have studied the utilization of TiB2 cathodes for thin film deposition in a DC vacuum arc system. We present a route for attaining a stable, reproducible, and fully ionized plasma flux of Ti and B by removal of the external magnetic field, which leads to dissipation of the vacuum arc discharge and an increased active surface area of the cathode. Applying a magnetic field resulted in instability and cracking, consistent with the previous reports. Plasma analysis shows average energies of 115 and 26 eV, average ion charge states of 2.1 and 1.1 for Ti and B, respectively, and a plasma ion composition of approximately 50% Ti and 50% B. This is consistent with measured resulting film composition from X-ray photoelectron spectroscopy, suggesting a negligible contribution of neutrals and macroparticles to the film growth. Also, despite the observations of macroparticle generation, the film surface is very smooth. These results are of importance for the utilization of cathodic arc as a method for synthesis of metal borides. (C) 2015 AIP Publishing LLC.

Funding Agencies|European Research Council under the European Community Seventh Framework Program (FP7)/ERC [258509]; Swedish Research Council (VR) [642-2013-8020]; Knut and Alice Wallenberg Foundation; SSF synergy grant FUNCASE

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Vacuum arc plasma generation and thin film deposition from a TiB₂cathode

et al. 2015

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“…Compared to classic metallic cathode materials such as Ti or Cr, the arc spot on TiB 2 tends to stick to a specific location leading to local overheating, cracking and disintegration of the cathode [10]. In addition, arc triggering is difficult, and arc stability (time until the arc spot disappears and has to be triggered again) is very low [11]. Finally, despite TiB 2 's high melting point, a high rate of macroparticle generation is observed [10,11].…”

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“…In addition, arc triggering is difficult, and arc stability (time until the arc spot disappears and has to be triggered again) is very low [11]. Finally, despite TiB 2 's high melting point, a high rate of macroparticle generation is observed [10,11]. Two routes have been proposed to overcome some of the arc stability issues.…”

Section: Introductionmentioning

confidence: 99%

“…These authors also stated that sintering additives had an influence on arc behaviour, but they did not present the exact chemical composition of each cathode tested [10]. Trelegilo et al [11], on the other hand, attempted to overcome these problems by using pulsed-arc evaporation. Others who had used DC-bias reported that high compressive stress in the deposited coatings led to coating fracture.…”

Section: Introductionmentioning

confidence: 99%

“…Others who had used DC-bias reported that high compressive stress in the deposited coatings led to coating fracture. Pulsed high-voltage bias allowed Trelegilo et al to overcome this problem; however, the physical nature of this solution remains unknown [11].…”

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confidence: 99%

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Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation

et al. 2020

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TiB2 is well established as a superhard coating with a high melting point and a low coefficient of friction. The brittle nature of borides means they cannot be utilised with arc evaporation, which is commonly used for the synthesis of hard coatings as it provides a high deposition rate, fully ionised plasma and good adhesion. In this work, TiB2 conical cathodes with non-standard sintering additives (carbon and TiSi2) were produced, and the properties of the base material, such as grain structure, hardness, electrical resistivity and composition, were compared to those of monolithic TiB2. The dependence of the produced cathodes’ electrical resistivity on temperature was evaluated in a furnace with an argon atmosphere. Their arc–evaporation suitability was assessed in terms of arc mobility and stability by visual inspection and by measurements of plasma electrical potential. In addition, shaping the cathode into a cone allowed investigation of the influence of an axial magnetic field on the arc spot. The produced cathodes have a bulk hardness of 23–24 GPa. It has been found that adding 1 wt% of C ensured exceptional arc-spot stability and mobility, and requires lower arc current compared to monolithic TiB2. However, poor cathode utilization has been achieved due to the steady generation of cathode flakes. The TiB2 cathode containing 5 wt% of TiSi2 provided the best balance between arc-spot behaviour and cathode utilisation. Preventing cathode overheating has been identified as a main factor to allow high deposition rate (±1.2 µm/h) from TiB2-C and TiB2-TiSi2 cathodes.

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Hard Transition-Metal Diboride Coatings

Mikula

2024

Advanced Structured Materials

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Deposition of TiB2 at low temperature with low residual stress by a vacuum arc plasma source

Cited by 29 publications

References 4 publications

Vacuum arc plasma generation and thin film deposition from a TiB₂cathode

Vacuum arc plasma generation and thin film deposition from a TiB₂cathode

Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation

Hard Transition-Metal Diboride Coatings

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Deposition of TiB2 at low temperature with low residual stress by a vacuum arc plasma source

Cited by 29 publications

References 4 publications

Vacuum arc plasma generation and thin film deposition from a TiB2cathode

Vacuum arc plasma generation and thin film deposition from a TiB2cathode

Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation

Hard Transition-Metal Diboride Coatings

Contact Info

Product

Resources

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Vacuum arc plasma generation and thin film deposition from a TiB₂cathode

Vacuum arc plasma generation and thin film deposition from a TiB₂cathode