Deposition of ultraviolet photoconductive films of amorphous hydrogenated carbon

Abstract

The structural, optical, and transport properties of hydrogenated amorphous carbon films deposited on the grounded electrode under different dilutions (pure CH4, CH4+H2, and CH4+Ar) in radio frequency powered plasma enhanced chemical vapor deposition process have been studied. Though all the samples deposited were observed to be polymer-like carbon, they have different optical and transport properties. While some of the samples were highly conductive under dark (∼10−1Scm−1 at room temperature), others exhibited very low (<10−12Scm−1) dark conductivity and were photoconductive (∼10−9–10−10Scm−1) only under ultraviolet (UV) light (wavelength λ<250nm). There appears to be a close link between the transport properties and optical absorption. Based on optical absorption, we propose two possible models for the distribution of the density of states involving the π and σ states. The evolution of these states and of the deep defect absorption has a profound impact on the transport properties and particularly on the UV photoconductivity. Comparing the two models, it seems more probable that the UV photoconductivity (for photon energy >4.96eV) is rather linked to transitions involving the σ-σ* states.

H2: The Critical Juncture between Polymerization and Dissociation of Hydrocarbons in a Low‐temperature Plasma

“…Plasma‐enhanced chemical vapour deposition (PE‐CVD) is widely used for the deposition of hydrogenated amorphous carbon ( a ‐C:H) thin films as e.g. protective coatings on steel wire or anti‐reflection coatings 1–4. One of the PE‐CVD techniques is remote plasma deposition in which an acetylene precursor is admixed to an expanding thermal argon plasma, generated by a cascaded arc 5–9.…”