Deposition of ZnO nanostructured film at room temperature on glass substrates by activated reactive evaporation

Abstract

ZnO nanostructured films were deposited on glass substrates at room temperature by activated reactive evaporation technique. Thermal evaporation of zinc at high deposition rate in presence of oxygen plasma resulted in deposition of ZnO nanostructured film with different flower-like morphologies on glass substrates. The structural and morphological properties of these nanostructured films were studied by XRD, SEM and TEM. A gas phase growth mechanism has been proposed for the formation of nanostructures. The room temperature photoluminescence spectra of these films exhibited weak ultraviolet (UV) and strong broad visible emission peaks. Further, the position of visible emission peak is found to vary with morphology of the grown nanostructured films. Photocurrent measurements indicated that these ZnO nanostructured films show high sensitivity to UV light, and hence can be used as efficient UV photodetectors.

Zinc Oxide Thin Film Synthesized by Sol-Gel Method

“…As the ZnO approach the range of UV radiation, the refractive index and penetration depth value decrease. Under dark condition, the effect is opposite and the output intensity decrease depends on the rate at which oxygen molecules are absorbed onto the surface of ZnO nanostructure as the UV light was turned off [19]. The power output decrease slowly to reach saturation and when UV light is removed, the values recover nearly to the original state as the initial value.…”