Deposition routes of molecularly imprinted silica for the development of highly specific electrochemical “in-field” sensors

Composite Silica‐Based Films as Platforms for Electrochemical Sensors

“…[92] For MIS materials, the most common strategies include non-covalent entrapment. [96] MIS films are fabricated using the sol-gel technique and the overall procedure involves successive steps:…”

“…Typical MIPs can be obtained by polymerization involving either non‐covalent imprinting (which can be realised by physical, hydrophobic, van der Waals forces, hydrogen bond or electrostatic interactions between the analyte molecule and the polymer network) or imprinting via reversible covalent attachment [92] . For MIS materials, the most common strategies include non‐covalent entrapment [96] . MIS films are fabricated using the sol‐gel technique and the overall procedure involves successive steps: (1) the preparation of a sol containing the suitable silica and organosilica precursors and the target probe molecule (called “template”), (2) the physical entrapment of the template during gelation (cross‐linking) of the sol, and (3) the removal of the template from the dry silica matrix.…”

“…Various routes for coating MIS onto electrode surfaces can be followed (Figure 3A). [96] The most straightforward ones are based on the physical deposition of the sol by spin‐coating or drop casting, for which gelation is induced by evaporation with concomitant MIS formation [97–−100] . They are convenient for film formation on flat electrode supports.…”