2012
DOI: 10.2494/photopolymer.25.121
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Depth Dependence of Time Delay Effect on Hydrogen Silsesquioxane (HSQ) Resist Layers

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Cited by 3 publications
(2 citation statements)
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“…It must be noted that silver is selected as a metal cap layer due to its smallest total damping rate (Γ = 0.02 eV), lowest loss, much better surface plasmon polariton (SPP) confinement at telecommunication wavelengths, highest SPP quality factor in visible and near-infrared regions, and low fabrication cost 20 . In addition, HSQ as an amorphous structure similar to silica with a good adhesion on silicon wafers, is a good candidate for the low-index layer of the proposed HPW due to some advantages including high uniformity, high etching resistance, high resolution, and minimum line edge roughness 21 . Distribution of the electric field y-component (|E y |) of the fundamental quasi-TM mode at 1550 nm (193.5 THz) is depicted in Fig.…”
Section: Hybrid Plasmonic Waveguidementioning
confidence: 99%
“…It must be noted that silver is selected as a metal cap layer due to its smallest total damping rate (Γ = 0.02 eV), lowest loss, much better surface plasmon polariton (SPP) confinement at telecommunication wavelengths, highest SPP quality factor in visible and near-infrared regions, and low fabrication cost 20 . In addition, HSQ as an amorphous structure similar to silica with a good adhesion on silicon wafers, is a good candidate for the low-index layer of the proposed HPW due to some advantages including high uniformity, high etching resistance, high resolution, and minimum line edge roughness 21 . Distribution of the electric field y-component (|E y |) of the fundamental quasi-TM mode at 1550 nm (193.5 THz) is depicted in Fig.…”
Section: Hybrid Plasmonic Waveguidementioning
confidence: 99%
“…Ekinci et al reported that ultimate resolution limit of HSQ material has marked the world record as narrow as 7nm HP LS although high energy EUV dose was required [44]. Dinh et al noticed that film quality after coating was of great concern [45], but HSQ resist still attracts researchers' attention.…”
Section: Hydrosilsesquioxanes (Hsq)mentioning
confidence: 99%