Design and analysis of a 3-DOF planar micromanipulation stage with large rotational displacement for micromanipulation system

Abstract

Abstract. Flexure-based mechanisms have been widely used for scanning tunneling microscopy, nanoimprint lithography, fast servo tool system and micro/nano manipulation. In this paper, a novel planar micromanipulation stage with large rotational displacement is proposed. The designed monolithic manipulator has three degrees of freedom (DOF), i.e. two translations along the X and Y axes and one rotation around Z axis. In order to get a large workspace, the lever mechanism is adopted to magnify the stroke of the piezoelectric actuators and also the leaf beam flexure is utilized due to its large rotational scope. Different from conventional pre-tightening mechanism, a modified pre-tightening mechanism, which is less harmful to the stacked actuators, is proposed in this paper. Taking the circular flexure hinges and leaf beam flexures hinges as revolute joints, the forward kinematics and inverse kinematics models of this stage are derived. The workspace of the micromanipulator is finally obtained, which is based on the derived kinematic models.

Optimum design and analysis of flexure-based mechanism for non-circular diamond turning operation

“…Referring to the properties of the PEA, the stacked PEAs are very sensitive to the lateral force and moment. 16 In order to avoid lateral loads or moments on the PEA, a steel ball is adopted to connect with the moving platform and PEA. In this study, the 7075 À T6 aluminum alloy material with the density r = 2:77e À3 g=mm 3 , yield strength s y = 435 MPa, and Young's modulus E = 7:2e 4 MPa is adopted.…”

Nanometer Precision With a Planar Parallel Continuum Robot

“…Flexure hinge-based compliant structures actuated by piezoelectric, electromagnetic, electrostatic or electrothermal actuators are thus preferred [4]- [7]. However, this type of mechanism has very limited workspace in position as well as in rotation [5].…”

An investigation on kinematics and dynamics performance of a novel 3-PRC-compliant parallel micromanipulator

“…8,9 Utilizing an amplifier mechanism is the most effective way to amplify the stroke of micromanipulation stage, and the lever amplifier mechanism, bridge-type amplification mechanism, and Scott-Russell mechanism are commonly used in micromanipulation stages. [10][11][12] In the study by Ding et al, 13 a 3-degree-of-freedom (DOF) planar micromanipulation stage with large rotational displacement for micromanipulation is designed with the workspace of 84.62 mm 3 97.12 mm 3 10.28 mrad, and the lever mechanism is adopted to magnify the stroke of the piezoelectric actuators in order to get a large workspace. Liu et al 14 presented an XY parallel nanopositioner with symmetric and two-stage displacement amplifiers, and this mechanism has a large workspace more than 200 mm and a high natural frequency at about 760 Hz.…”

“…In the study by Ding et al, 13 a 3-degree-of-freedom (DOF) planar micromanipulation stage with large rotational displacement for micromanipulation is designed with the workspace of 84.62 μm × 97.12 μm × 10.28 mrad, and the lever mechanism is adopted to magnify the stroke of the piezoelectric actuators in order to get a large workspace. Liu et al 14 presented an XY parallel nanopositioner with symmetric and two-stage displacement amplifiers, and this mechanism has a large workspace more than 200 μm and a high natural frequency at about 760 Hz.…”