2020
DOI: 10.1088/1361-6641/abbc8d
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Design and analysis of electro-optic modulators based on high contrast gratings in AlGaN/GaN heterostructures

Abstract: Recently High Electron Mobility Transistor (HEMT) inspired III-V electro-optic modulator topologies were proposed for realizing high speed electro-optic modulators leveraging plasma dispersion effect due to the 2D Electron Gas (2DEG) present at the III-V heterostructure interface. The 2DEG is highly confined at the interface, extending to very low depths in the bulk (≈10 nm) and therefore has limited spatial overlap with the optical mode. In this paper, we propose a novel modulator design to boost the 2DEG-lig… Show more

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Cited by 4 publications
(4 citation statements)
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“…Even the 2DEG layer is highly localized to improve the modulation efficiency significantly but when compared to their previous work, not that much improvement is observed. [ 15 ] To exploit properties of embedded GaN layer, the researchers used freestanding GaN to achieve high emission efficiency, and all pass transmission by removing the substrate while eliminating the side‐lobe reflectivity. Unlike traditional multilayer dielectric film layers, freestanding structures are more compact, and the lattice mismatch between the GaN and substrate layers can be minimized.…”
Section: Introductionmentioning
confidence: 99%
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“…Even the 2DEG layer is highly localized to improve the modulation efficiency significantly but when compared to their previous work, not that much improvement is observed. [ 15 ] To exploit properties of embedded GaN layer, the researchers used freestanding GaN to achieve high emission efficiency, and all pass transmission by removing the substrate while eliminating the side‐lobe reflectivity. Unlike traditional multilayer dielectric film layers, freestanding structures are more compact, and the lattice mismatch between the GaN and substrate layers can be minimized.…”
Section: Introductionmentioning
confidence: 99%
“…[11] On the other side, photonic integrated circuits are thriving with the help of III-nitride-based semiconductor materials for numerous optical devices such as lasers, modulators, couplers, sensors, and detectors. [12][13][14][15] Group III-nitride materials enabled development of a single chip with all the optical devices integrated and connected using inbuilt optical interconnects. [16] The reasons to explore GaN/AlN/AlGaN are wide transparency window (UV-IR), high birefringence, high nonlinear coefficient, and low thermo-optic coefficient.…”
Section: Introductionmentioning
confidence: 99%
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“…GaN has emerged as a superior platform in various domains from high-power terahertz (THz) imaging and spectroscopy systems, monolithic microwave integrated circuits (MMICs), to nonlinear optics owing to its rich material properties such as wide band gap, high electron saturation velocity and high breakdown voltage, and wide band operation from UV to IR region [13,14]. This has spawned several device applications such as photo-diodes [15], lasers [16], electro-optical modulators [17] etc. With its proven technical prowess for highspeed and high-power applications, and emerging research in exploitation of electro-optic properties, coupled with ease of manufacturing [18][19][20], GaN based chip-scale photonic ICs are well poised to morph into a strong platform for optoelectronic monolithic integration.…”
Section: Introductionmentioning
confidence: 99%