2021
DOI: 10.3390/s21113809
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Design and Characterization of Backside Termination Structures for Thick Fully-Depleted MAPS

Abstract: Fully Depleted Monolithic Active Pixel Sensors (FD-MAPS) represent an appealing alternative to hybrid detectors for radiation imaging applications. We have recently demonstrated the feasibility of FD-MAPS based on a commercial 110 nm CMOS technology, adapted using high-resistivity substrates and backside post-processing. A p/n junction diode, fabricated on the detector backside using low-temperature processing steps after the completion of the front-side Back End of Line (BEOL), is reverse-biased to achieve th… Show more

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Cited by 4 publications
(5 citation statements)
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“…To enable particle identification and pileup rejection, a challenging requirement in terms of detector timing resolution, that should be lower than 20 ps, has been set for the sensors of the ToF layers of the ALICE 3 detector. Those sensors will also have to guarantee a moderate radiation hardness in terms of Non-Ionizing Energy Loss (NIEL) and Total Ionizing Dose (TID) in the order of 10 13 1 MeV n eq cm −2 and 1 Mrad, respectively [15].…”
Section: Jinst 19 C02036mentioning
confidence: 99%
See 1 more Smart Citation
“…To enable particle identification and pileup rejection, a challenging requirement in terms of detector timing resolution, that should be lower than 20 ps, has been set for the sensors of the ToF layers of the ALICE 3 detector. Those sensors will also have to guarantee a moderate radiation hardness in terms of Non-Ionizing Energy Loss (NIEL) and Total Ionizing Dose (TID) in the order of 10 13 1 MeV n eq cm −2 and 1 Mrad, respectively [15].…”
Section: Jinst 19 C02036mentioning
confidence: 99%
“…A continuous p-type implant was included on the backside surface of the 100 μm thick sensors to create the backside p-n junction. Instead, a dedicated backside lithography step was used to form the backside p-n junction and the guard rings designed to prevent the junction breakdown in the devices with 200 μm active thickness [13]. A surface n-type epitaxial layer, having a higher doping concentration than the n-type active volume, is present in all wafers.…”
Section: Introductionmentioning
confidence: 99%
“…In an analogous way, the backside terminating structures included around the pixel matrices of type 3 wafers were designed to guarantee a breakdown voltage higher than the upper bound of the operating voltage range. We reported in [12] the simulation results and the experimental measurements performed on backside diodes with variable floating guard ring number included in a previous production. The reported data demonstrated the effectiveness of the designed backside structures, which were able to stand a bias voltage exceeding 400 V. Figure 3 represents an example of the IV curves measured on two pixel arrays with 50 and 25 μm pixel pitch and a matrix area of 1.5 × 1.5 mm 2 extracted from a wafer with 48 μm active substrate thickness.…”
Section: Jinst 18 C02045 2 Electrical Characterization Of Passive Pix...mentioning
confidence: 99%
“…Within the SEED project, predecessor of ARCADIA, a first production of passive test-structures and a test chip called MATISSE [9] had been produced. A passive pixel matrix (also called pseudo-matrix) consisting of three pixel areas with three different pixel pitches; 10, 25 and 50 μm, was designed and tested [10]. Thereby the sub-matrices consist of 40 × 45, 16 × 18, and 8 × 9 pixels, respectively, sharing a common readout electrode.…”
Section: Simulation Validation On Passive Pixel Matricesmentioning
confidence: 99%