Design and kinematics analysis of a 3-DOF precision positioning stage

Abstract

This paper presents a novel 3-DOF precision positioning stage for nanoimprint lithograph (NIL). Due to the advantages such as high positioning accuracy, dexterity, low inertial, and balanced mechanical structure, a piezo-driven flexure-based parallel mechanism is utilized. Based on Pseudo-Rigid-Body modelling theory, the kinematics of the stage is developed by sim plifying the single-axis flexure hinges as ideal revolute joints. A modified coefficient matrix is introduced to optimize the theoretic results and overcome the position error induced by the deformations of long links and flexure hinges. Finite element analysis is used to verify the kinematic performance of the stage and obtain the modified coefficient matrix. The numerical simulations are carried out to validate the established model.Index Terms -nanoimprint lithograph, precision positioning stage, kinematic analysis, parallel mechanism, Pseudo-Rigid-Body Model.

Design of Stress Release Support Mechanism for Large-Size Body-Mounted Radiator

“…The total height of the three mechanisms is 30.5 mm, and the total width and length are both 60 mm. The fixed support adopts an upper and lower modular structure [22], connected by bolts to the top cover and bottom support, limiting the freedom of the radiator in the lateral and longitudinal directions, ensuring that the radiator is fixed on the space telescope frame, as shown in Figure 5a. The commonly used release line freedom mechanism is the V-shaped guide slider mechanism.…”