Design and Optimization of the Monochromator for the New Residual Stress Diffractometer

Abstract

The monochromator for the new residual stress diffractometer at China Advanced Research Reactor (CARR) was simulated and optimized using SIMRES software. Objected the Fe (211) diffraction peak, the effect of horizontal and vertical curvature of Si (400) monochromator on Figure of Merit was studied to optimize the focusing parameters. With the optimal focusing condition, the influence of wafer thickness, number of wafers, packet height and gap of packets on performance of instrument was calculated consequently and the corresponding geometrical size was fixed. Finally, the design of the monochromator for the new residual stress diffractometer at CARR was completed.