Design and performance of a scanning ptychography microscope

Nazaretski, Evgeny; Huang, Xiaojing; Yan, Hongyuan; Lauer, Kenneth; Conley, Ray; Bouet, Nathalie; Zhou, Juan; Xu, Weihe; Eom, Daejin; Legnini, D.; Harder, Ross; Lin, Chih-Hsun; Chen, Y.; Hwu, Y.; Chu, Yong S.

doi:10.1063/1.4868968

Cited by 34 publications

(22 citation statements)

References 26 publications

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“…The RMS background noise observed equals $ 0.35 nm and 0.5 nm steps were clearly resolved. The background noise is consistent with noise levels demonstrated earlier on stiff test structures (see Nazaretski et al, 2013), and confirms the stability of the microscope with minimal amplification of environmental vibrations.…”

Section: Preliminary Characterization Of the Microscopesupporting

confidence: 89%

“…These requirements (multiple degrees of motion and short working distances) pose a challenge for designing of an apparatus capable of performing scanning measurements, and at the same time providing adequate stability to minimize vibrations and reduce possible thermal drifts. Though previous MLL systems demonstrated excellent performance, they had a large footprint, were not vacuum compatible and were not equipped with interferometric feedback for enhanced stability (Nazaretski et al, 2013(Nazaretski et al, , 2014Shu et al, 2013), all of which are essential when enhanced functionality of a system is required. Therefore, to enable in-vacuum performance, provide enough stability and reduce thermal drifts, the apparatus shown in Figs.…”

Section: Design Of the Mll Microscopementioning

confidence: 99%

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Pushing the limits: an instrument for hard X-ray imaging below 20 nm

Nazaretski

Lauer

Yan

et al. 2015

J Synchrotron Radiat

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Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10 nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2 nm h(-1) accompanied by 13 nm × 33 nm imaging resolution at 11.8 keV are reported.

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Section: Preliminary Characterization Of the Microscopesupporting

confidence: 89%

Section: Design Of the Mll Microscopementioning

confidence: 99%

Pushing the limits: an instrument for hard X-ray imaging below 20 nm

Nazaretski

Lauer

Yan

et al. 2015

J Synchrotron Radiat

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“…At the HXN beamline, where we used a slightly modified test system to accommodate our MLLs, a portion of the monochromatized beam was selected by an aperture placed in the secondary source of the beamline, approximately 8 m upstream of the lenses, to achieve a spatial coherence length matched to the width of the lenses. Each lens in its mount was attached to an independent and motorized stage with both translational and rotational degrees of freedom with linear and angular resolutions of approximately 0.1 μm and 5 μrad, respectively 28 , 29 . The lenses were mounted to focus in the horizontal and vertical directions.…”

Section: Methodsmentioning

confidence: 99%

X-ray focusing with efficient high-NA multilayer Laue lenses

Bajt¹,

Prasciolu²,

Fleckenstein

et al. 2017

Light Sci Appl

137

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Multilayer Laue lenses are volume diffraction elements for the efficient focusing of X-rays. With a new manufacturing technique that we introduced, it is possible to fabricate lenses of sufficiently high numerical aperture (NA) to achieve focal spot sizes below 10 nm. The alternating layers of the materials that form the lens must span a broad range of thicknesses on the nanometer scale to achieve the necessary range of X-ray deflection angles required to achieve a high NA. This poses a challenge to both the accuracy of the deposition process and the control of the materials properties, which often vary with layer thickness. We introduced a new pair of materials—tungsten carbide and silicon carbide—to prepare layered structures with smooth and sharp interfaces and with no material phase transitions that hampered the manufacture of previous lenses. Using a pair of multilayer Laue lenses (MLLs) fabricated from this system, we achieved a two-dimensional focus of 8.4 × 6.8 nm2 at a photon energy of 16.3 keV with high diffraction efficiency and demonstrated scanning-based imaging of samples with a resolution well below 10 nm. The high NA also allowed projection holographic imaging with strong phase contrast over a large range of magnifications. An error analysis indicates the possibility of achieving 1 nm focusing.

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“…For this experiment, shadow images of a Siemens star test sample were recorded at the NSLS-II HXN beamline (Nazaretski et al, 2014(Nazaretski et al, , 2017. Fig.…”

Section: Image Reconstruction With the Example Of The Siemens Star Samentioning

confidence: 99%

Ptychographic X-ray speckle tracking with multi-layer Laue lens systems

Morgan¹,

Murray²,

Prasciolu³

et al. 2020

J Appl Crystallogr

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The ever-increasing brightness of synchrotron radiation sources demands improved X-ray optics to utilize their capability for imaging and probing biological cells, nano-devices and functional matter on the nanometre scale with chemical sensitivity. Hard X-rays are ideal for high-resolution imaging and spectroscopic applications owing to their short wavelength, high penetrating power and chemical sensitivity. The penetrating power that makes X-rays useful for imaging also makes focusing them technologically challenging. Recent developments in layer deposition techniques have enabled the fabrication of a series of highly focusing X-ray lenses, known as wedged multi-layer Laue lenses. Improvements to the lens design and fabrication technique demand an accurate, robust, in situ and at-wavelength characterization method. To this end, a modified form of the speckle tracking wavefront metrology method has been developed. The ptychographic X-ray speckle tracking method is capable of operating with highly divergent wavefields. A useful by-product of this method is that it also provides high-resolution and aberration-free projection images of extended specimens. Three separate experiments using this method are reported, where the ray path angles have been resolved to within 4 nrad with an imaging resolution of 45 nm (full period). This method does not require a high degree of coherence, making it suitable for laboratory-based X-ray sources. Likewise, it is robust to errors in the registered sample positions, making it suitable for X-ray free-electron laser facilities, where beam-pointing fluctuations can be problematic for wavefront metrology.

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Design and performance of a scanning ptychography microscope

Cited by 34 publications

References 26 publications

Pushing the limits: an instrument for hard X-ray imaging below 20 nm

Pushing the limits: an instrument for hard X-ray imaging below 20 nm

X-ray focusing with efficient high-NA multilayer Laue lenses

Ptychographic X-ray speckle tracking with multi-layer Laue lens systems

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